| Presentation | 1997/7/24 Effects of grain size and crystalline orientation on the TiSi_2 C49-C54 transformation : Mechanism of pre-amorphization implantation effects in the TiSi_2 C49-C54 transformation Tomoji Nakamura, Hirofumi Tomita, Kazuto Ikeda, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | The effects of pre-amorphization implantation (PAI) on the TiSi_2 C49-C54 transformation has been studied. The PAI treatment noticeably decreases the C49 grain size and the smaller C49-grain sample shows faster transformation to C54-TiSi_2. According to the orientational analysis of C49-TiSi_2 grains to the Si(001) substrate, the PAI treatment suppresses the epitaxial growth of C49-TiSi_2 on Si (001) substrate and the poorer orientational alignment of C49-TiSi_2 causes a more rapid transformation to C54-TiSi_2. We believe this suppression of epitaxial alignment is a possible mechanism to understand the effect of the PAI treatment on the C49-C54 transformation. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | TitaniLlm silicide / TiSi2 / C49 / C54 / Phase transformation / Pre-amorphization |
| Paper # | SDM97-44 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1997/7/24(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Effects of grain size and crystalline orientation on the TiSi_2 C49-C54 transformation : Mechanism of pre-amorphization implantation effects in the TiSi_2 C49-C54 transformation |
| Sub Title (in English) | |
| Keyword(1) | TitaniLlm silicide |
| Keyword(2) | TiSi2 |
| Keyword(3) | C49 |
| Keyword(4) | C54 |
| Keyword(5) | Phase transformation |
| Keyword(6) | Pre-amorphization |
| 1st Author's Name | Tomoji Nakamura |
| 1st Author's Affiliation | Fujitsu Laboratories Ltd., Materials & Materials Engineering Labs.() |
| 2nd Author's Name | Hirofumi Tomita |
| 2nd Author's Affiliation | Fujitsu Laboratories Ltd., Materials & Materials Engineering Labs. |
| 3rd Author's Name | Kazuto Ikeda |
| 3rd Author's Affiliation | Fujitsu Laboratories Ltd., Materials & Materials Engineering Labs. |
| Date | 1997/7/24 |
| Paper # | SDM97-44 |
| Volume (vol) | vol.97 |
| Number (no) | 195 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |