| Presentation | 1993/6/18 Sub-micron electrode fabrication thechnology using anodic oxidation resist and application to SAW devices. Kazuhiko Yamanouchi, Toshiyasu Meguro, Yasuo Wagatsuma, Hiroyuki Odagawa, Keiichi Yamamoto, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Sub-micon lithography technology is very important for high density integrated circuits and higher frequency-range SAW devices. The frequency range of mobile communication systems are now in 1 GHz and in extending to 2～4 GHz.Moreover SAW devices require the f requency range of around 10 GHz.In this paper,we propose a new lithography techniques of sub-micron electrodo width.The electrodes are fabricated by using very thin anodic oxidation films as resists and wet or dry etching techniques.The results show the 0.1μm width IDT with thickness of about 0.03μm on 128゜Y- X LiNbO_3.Also,new lithography technologies are applied to 1～2 GHz filters using the unidirectional transducer. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Nano-meter / Fine-Lithography / Anodic Oxidation / Inter- Digital Transducer / Surface Acoustic Wave / Low-Loss Filter |
| Paper # | US93-16,CPM93-30 |
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| Conference Information | |
| Committee | US |
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| Conference Date | 1993/6/18(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Ultrasonics (US) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Sub-micron electrode fabrication thechnology using anodic oxidation resist and application to SAW devices. |
| Sub Title (in English) | |
| Keyword(1) | Nano-meter |
| Keyword(2) | Fine-Lithography |
| Keyword(3) | Anodic Oxidation |
| Keyword(4) | Inter- Digital Transducer |
| Keyword(5) | Surface Acoustic Wave |
| Keyword(6) | Low-Loss Filter |
| 1st Author's Name | Kazuhiko Yamanouchi |
| 1st Author's Affiliation | Research Institute of Electrical Communication,Tohoku University() |
| 2nd Author's Name | Toshiyasu Meguro |
| 2nd Author's Affiliation | Research Institute of Electrical Communication,Tohoku University |
| 3rd Author's Name | Yasuo Wagatsuma |
| 3rd Author's Affiliation | Research Institute of Electrical Communication,Tohoku University |
| 4th Author's Name | Hiroyuki Odagawa |
| 4th Author's Affiliation | Research Institute of Electrical Communication,Tohoku University |
| 5th Author's Name | Keiichi Yamamoto |
| 5th Author's Affiliation | Research Institute of Electrical Communication,Tohoku University |
| Date | 1993/6/18 |
| Paper # | US93-16,CPM93-30 |
| Volume (vol) | vol.93 |
| Number (no) | 95 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |