| Presentation | 1995/9/22 Line-focus-beam acoustic microscopy characterization of glass fi1m materials on silicon substrates Takafumi MATSUMURA, Yuu ONO, Naoyuki AKASHI, Jun-ichi KUSHIBIKI, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | In this paper, application of line-focus-beam acoustic microscopy is extended to quantitative characterization of glass films on silicon substrates. Propagation characteristics, viz., phase velocity and normalized attenuation, for leaky Rayleigh mode and its higher order modes are thoretically investigated for three kinds of glass films having different elastic properties, and it is shown that the velocities decrease remarkably as a function of fH, where f is ultrasonic frequency and H is film thickness. A method of determining the film thickness using cut-off characteristics of leaky Sezawa and leaky pseud-Sezawa mode is proposed and demonstrated for a sample of fuse quartz film fabricated on silicon substrate. The fH dependence of propagation characteristics for the leaky Rayleigh and the leaky Sezawa modes, experimentally obtained using the determined film thickness, is in good agreement with the theoretical one, and it is suggested that this ultrasonic method is very useful for evaluating glass film materials on silicon substrates. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | line-focus-beam acoustic microscopy / leaky surface acoustic waves / silicon / glass film materials / cut-off characteristics / leaky Sezawa wave |
| Paper # | US95-49 |
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| Committee | US |
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| Conference Date | 1995/9/22(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Ultrasonics (US) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Line-focus-beam acoustic microscopy characterization of glass fi1m materials on silicon substrates |
| Sub Title (in English) | |
| Keyword(1) | line-focus-beam acoustic microscopy |
| Keyword(2) | leaky surface acoustic waves |
| Keyword(3) | silicon |
| Keyword(4) | glass film materials |
| Keyword(5) | cut-off characteristics |
| Keyword(6) | leaky Sezawa wave |
| 1st Author's Name | Takafumi MATSUMURA |
| 1st Author's Affiliation | Department of Electrical Engineering, Faculty of Engineering, Tohoku University() |
| 2nd Author's Name | Yuu ONO |
| 2nd Author's Affiliation | Department of Electrical Engineering, Faculty of Engineering, Tohoku University |
| 3rd Author's Name | Naoyuki AKASHI |
| 3rd Author's Affiliation | Department of Electrical Engineering, Faculty of Engineering, Tohoku University |
| 4th Author's Name | Jun-ichi KUSHIBIKI |
| 4th Author's Affiliation | Department of Electrical Engineering, Faculty of Engineering, Tohoku University |
| Date | 1995/9/22 |
| Paper # | US95-49 |
| Volume (vol) | vol.95 |
| Number (no) | 252 |
| Page | pp.pp.- |
| #Pages | 8 |
| Date of Issue | |