Presentation 2000/8/22
Surface Treatment of MgO Single-Crystal Substrate.
Yukie ISHII, Hideaki ZAMA, Tadataka MORISHITA, Hiroshi YAMAMOTO,
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Abstract(in English) MgO single crystal has been frequently used as a substrate for oxide film growth. It is difficult to obtain its surface treatment free from surface roughening and the diffusion of impurity. By investigating as-polished and annealed surface of MgO by an atomic force microscope, we realized an atomical flat surface without the diffusion of impurity at a lower annealing temperature, 700℃, under oxygen atmosphere.
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Keyword(in English) MgO / oxygen annealing / atomic force microscope(AFM) / atomical flat surface
Paper # SCE2000-11,MW2000-75
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Committee SCE
Conference Date 2000/8/22(1days)
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Registration To Superconductive Electronics (SCE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Surface Treatment of MgO Single-Crystal Substrate.
Sub Title (in English)
Keyword(1) MgO
Keyword(2) oxygen annealing
Keyword(3) atomic force microscope(AFM)
Keyword(4) atomical flat surface
1st Author's Name Yukie ISHII
1st Author's Affiliation College of Science and Technology, Nihon University()
2nd Author's Name Hideaki ZAMA
2nd Author's Affiliation Superconductivity Research Laboratory, International Superconductivity Technology Center
3rd Author's Name Tadataka MORISHITA
3rd Author's Affiliation Superconductivity Research Laboratory, International Superconductivity Technology Center
4th Author's Name Hiroshi YAMAMOTO
4th Author's Affiliation College of Science and Technology, Nihon University
Date 2000/8/22
Paper # SCE2000-11,MW2000-75
Volume (vol) vol.100
Number (no) 274
Page pp.pp.-
#Pages 5
Date of Issue