Presentation | 1994/4/20 Submicrometer patterning technique of oxide superconducting thin films using focused ion beam-Superconductivity of YBaCuO submicrometer line Masanobu Kusunoki, Hiroyuki Akaike, Akira Fujimaki, Hisao Hayakawa, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We have developed a deep submicrometer pattening technology of high critical temperature superconducting,films without degradation.The technology enabled us to patten a YBaCuO strip line with width of 180 nm.The line showed good superconducivity. The lithography technique is based on the Focused ion beam Implanted Niobium Patterning (FINP) method.We made Nb mask pattern using the technique which is expect to be 100 nm resolution.The patterns are transferred into the Au, YBaCuO layer in an Ar ion beam etching (IBE) step.Dependence on critical current density of line width systematically showed the importance of cooling to decrease the degradation of YBaCuO in the IBE. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | deep submicrometer patterning / YBaCuO / FINP / lithography / degradation / cooling |
Paper # | SCE94-8,MW94-8 |
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Conference Information | |
Committee | SCE |
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Conference Date | 1994/4/20(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Superconductive Electronics (SCE) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Submicrometer patterning technique of oxide superconducting thin films using focused ion beam-Superconductivity of YBaCuO submicrometer line |
Sub Title (in English) | |
Keyword(1) | deep submicrometer patterning |
Keyword(2) | YBaCuO |
Keyword(3) | FINP |
Keyword(4) | lithography |
Keyword(5) | degradation |
Keyword(6) | cooling |
1st Author's Name | Masanobu Kusunoki |
1st Author's Affiliation | Department of Electronics,Faculty of Engineering,Nagoya University() |
2nd Author's Name | Hiroyuki Akaike |
2nd Author's Affiliation | Department of Electronics,Faculty of Engineering,Nagoya University |
3rd Author's Name | Akira Fujimaki |
3rd Author's Affiliation | Department of Electronics,Faculty of Engineering,Nagoya University |
4th Author's Name | Hisao Hayakawa |
4th Author's Affiliation | Department of Electronics,Faculty of Engineering,Nagoya University |
Date | 1994/4/20 |
Paper # | SCE94-8,MW94-8 |
Volume (vol) | vol.94 |
Number (no) | 8 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |