| Presentation | 1998/11/16 Properties of Niobium and Aluminum Films made by Electron Cyclotron Resonance Sputtering System Antonio Esposito, Hiroshi Nakagawa, Hiroshi Akoh, Susumu Takada, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We performed growth of bcc niobium (Nb) and aluminum (Al) thin films as well as bilayer Nb/Al using Electron Cyclotron Resonance (ECR) technique on {100} Si substrates. We made Nb depositions using Xe plasma gases. We analyzed the surface topography of those films using reflection high-energy electron diffraction (RHEED) and atomic force microscopy (AFM). We found that the surface roughness of Nb films deposited by ECR is 4^～ 5times smaller than films deposited by magnetron sputtering systems, while Al very thin films on Nb show a remarkable match with Nb surfaces. This results in a good coverage of Nb base itself. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Electron Cyclotron Resonance / Sputtering / Niobium / Aluminum / Thin film |
| Paper # | SCE98-25 |
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| Conference Information | |
| Committee | SCE |
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| Conference Date | 1998/11/16(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Superconductive Electronics (SCE) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Properties of Niobium and Aluminum Films made by Electron Cyclotron Resonance Sputtering System |
| Sub Title (in English) | |
| Keyword(1) | Electron Cyclotron Resonance |
| Keyword(2) | Sputtering |
| Keyword(3) | Niobium |
| Keyword(4) | Aluminum |
| Keyword(5) | Thin film |
| 1st Author's Name | Antonio Esposito |
| 1st Author's Affiliation | Electrotechnical Laboratory() |
| 2nd Author's Name | Hiroshi Nakagawa |
| 2nd Author's Affiliation | Electrotechnical Laboratory |
| 3rd Author's Name | Hiroshi Akoh |
| 3rd Author's Affiliation | Electrotechnical Laboratory |
| 4th Author's Name | Susumu Takada |
| 4th Author's Affiliation | Saitama University |
| Date | 1998/11/16 |
| Paper # | SCE98-25 |
| Volume (vol) | vol.98 |
| Number (no) | 399 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |