| Presentation | 1998/7/28 Investigation of the uniformity of both-side YBCO thin films fabricated by inductive conpled plasma sputtering Masanobu Kusunoki, Toshiyuki Suzuki, Masasi Mukaida, Shigetoshi Ohshima, |
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| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | A fabrication technique for large area and both-side YBa_2Cu_3O_y thin films using inductive conpled plasma sputtering is discussed. The critical temperature Tc and the crystallinity of the film deposited on one side were almost the same as those of the film deposited on the other side. To investigate the uniformity of a film, a 50x50 sq.mm.substrate was cut into 10x10 sq.mm.cells. Thickness variations within 10% were obtained over an area with diameter larger than 40 mm., even when using a 50-mm diameter target. The values of the c-axis length, Tc, and critical current density at 77K were found to range from 1.1683～1.1693nm, 83.0～85.5 K, and 1.7～1.8mA/cm^2, respectively.The film was relatively homogeneous on a large area. On the other hand, the distribution of the Tc's does not correspond with that of the c-axis lengths obtained over various areas of the film. This indicates that microscopic inhomogeneity such as crystallinity or impurity could possibly exist in the film. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Inductive coupled plasma sputtering / YBa_2Cu_3O_y / Large area / both-side film / uniformity |
| Paper # | SCE98-16 |
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| Conference Information | |
| Committee | SCE |
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| Conference Date | 1998/7/28(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Superconductive Electronics (SCE) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Investigation of the uniformity of both-side YBCO thin films fabricated by inductive conpled plasma sputtering |
| Sub Title (in English) | |
| Keyword(1) | Inductive coupled plasma sputtering |
| Keyword(2) | YBa_2Cu_3O_y |
| Keyword(3) | Large area |
| Keyword(4) | both-side film |
| Keyword(5) | uniformity |
| 1st Author's Name | Masanobu Kusunoki |
| 1st Author's Affiliation | Faculty of Engineering, Yamagata University() |
| 2nd Author's Name | Toshiyuki Suzuki |
| 2nd Author's Affiliation | Faculty of Engineering, Yamagata University |
| 3rd Author's Name | Masasi Mukaida |
| 3rd Author's Affiliation | Faculty of Engineering, Yamagata University |
| 4th Author's Name | Shigetoshi Ohshima |
| 4th Author's Affiliation | Faculty of Engineering, Yamagata University |
| Date | 1998/7/28 |
| Paper # | SCE98-16 |
| Volume (vol) | vol.98 |
| Number (no) | 222 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |