Presentation 1993/7/26
Interfacial Study of Nb Josephson Junctions with AlOx,ZrOx and HfOx barriers by Cross-sectional Transmission Electron Microscopy
Shinichi Morohashi, Shinya Hasuo,
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Abstract(in English) Using cross-sectional transmission electron microscopy,we compared Nb, AlOx-Al/Nb junction with Nb/ZrOx-Zr/Nb and Nb/HfOx-Hf/ Nb junctions,and studied the interfaces of Nb Josephson junctions with an overlayer structure.The interface between the Zr layer and Nb base electrode,and that between the Hf layer and Nb were smoother than that between the Al layer and Nb.The roughness of the interface between Al and Nb is caused by not the roughness of the original Nb base electrode but grain boundary diffusion following Al deposition.Annealing increaged the roughness of the interface between Al and Nb,but had very little effects on the interfaces between Zr and Nb,or Hf and Nb.We attribute these effects to the differences in the melting points of the various overlayers.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Josephson junction / Cross-sectional Transmission Electron Microscopy
Paper # SCE93-28
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Committee SCE
Conference Date 1993/7/26(1days)
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Registration To Superconductive Electronics (SCE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Interfacial Study of Nb Josephson Junctions with AlOx,ZrOx and HfOx barriers by Cross-sectional Transmission Electron Microscopy
Sub Title (in English)
Keyword(1) Josephson junction
Keyword(2) Cross-sectional Transmission Electron Microscopy
1st Author's Name Shinichi Morohashi
1st Author's Affiliation FUJITSU LABORATORIES LTD.()
2nd Author's Name Shinya Hasuo
2nd Author's Affiliation FUJITSU LABORATORIES LTD.
Date 1993/7/26
Paper # SCE93-28
Volume (vol) vol.93
Number (no) 166
Page pp.pp.-
#Pages 6
Date of Issue