Presentation 1996/2/21
Crystal Engineering of oxide films for Josephson tunnel junction
Masashi Kawasaki, Hideyuki Kubota, Ryuta Tsuchiya, Kenichi Nakano, Naoki Kanda, Tadashi Shiraishi, Hideomi Koinuma,
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Abstract(in English) We have described our approach to the fabrication of high-Tc Josephson tunnel junction. We developed "temperature gradient method " to obtain high quality (smooth, high Tc, and crack free) a-axis oriented Yba_2Cu_3O_<7-δ> (YBCO) films by inserting a suitable buffer YBCO layer. Wet etching technique was developed to finish the SrTiO_3 substrate with an atomically smooth surface. This surface enabled us to perform perfect layer-by-layer growth of insulating oxides by laser MBE. Combining these techniques, we have fabricated S (superconducting)-I (insulating)-S structures and processed them into devices. The cross sectioned microstructure was examined for the specimens cross-sectioned by focused ion beam milling. The structures from atomic scale to device scale were elucidated to be consistent with those we have designed.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) a-axis oriented YBCO thin films / RHEED / FIB / SIM / TEM
Paper # SCE95-36
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Conference Information
Committee SCE
Conference Date 1996/2/21(1days)
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Registration To Superconductive Electronics (SCE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Crystal Engineering of oxide films for Josephson tunnel junction
Sub Title (in English)
Keyword(1) a-axis oriented YBCO thin films
Keyword(2) RHEED
Keyword(3) FIB
Keyword(4) SIM
Keyword(5) TEM
1st Author's Name Masashi Kawasaki
1st Author's Affiliation The Research Laboratory of Engineering Materials, Tokyo Institute of Technology()
2nd Author's Name Hideyuki Kubota
2nd Author's Affiliation The Research Laboratory of Engineering Materials, Tokyo Institute of Technology
3rd Author's Name Ryuta Tsuchiya
3rd Author's Affiliation The Research Laboratory of Engineering Materials, Tokyo Institute of Technology
4th Author's Name Kenichi Nakano
4th Author's Affiliation Tokai University
5th Author's Name Naoki Kanda
5th Author's Affiliation The Research Laboratory of Engineering Materials, Tokyo Institute of Technology
6th Author's Name Tadashi Shiraishi
6th Author's Affiliation Tokai University
7th Author's Name Hideomi Koinuma
7th Author's Affiliation The Research Laboratory of Engineering Materials, Tokyo Institute of Technology
Date 1996/2/21
Paper # SCE95-36
Volume (vol) vol.95
Number (no) 531
Page pp.pp.-
#Pages 6
Date of Issue