Presentation 1997/7/30
Fabrication and characterization of epitaxial Nb films
M. Matsuda, M. Matsumoto, N. Taneda, F. Hirayama, S. Kuriki,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Single-crystal-like Nb films with low normal state resistivities were grown epitaxially on (11^^-02) sapphire substrates at above 500℃ by either a dc magnetron sputtering or an electron-beam evaporation method. Prepared Nb films have very flat surface, shorter magnetic penetration depths (λ) and longer superconducting coherence lengths (ξ_) than the polycrystalline Nb films.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Nb film / epitaxial growth / residual resistance ratio / penetration depth / magnetization properties
Paper # sce97-17
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Conference Information
Committee SCE
Conference Date 1997/7/30(1days)
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Paper Information
Registration To Superconductive Electronics (SCE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication and characterization of epitaxial Nb films
Sub Title (in English)
Keyword(1) Nb film
Keyword(2) epitaxial growth
Keyword(3) residual resistance ratio
Keyword(4) penetration depth
Keyword(5) magnetization properties
1st Author's Name M. Matsuda
1st Author's Affiliation Muroran Institute of Technology()
2nd Author's Name M. Matsumoto
2nd Author's Affiliation Muroran Institute of Technology
3rd Author's Name N. Taneda
3rd Author's Affiliation Muroran Institute of Technology
4th Author's Name F. Hirayama
4th Author's Affiliation Electrotechnical Laboratory
5th Author's Name S. Kuriki
5th Author's Affiliation Research Institute for Electronic Science, Hokkaido University
Date 1997/7/30
Paper # sce97-17
Volume (vol) vol.97
Number (no) 219
Page pp.pp.-
#Pages 5
Date of Issue