Presentation | 1997/7/30 Fabrication and characterization of epitaxial Nb films M. Matsuda, M. Matsumoto, N. Taneda, F. Hirayama, S. Kuriki, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Single-crystal-like Nb films with low normal state resistivities were grown epitaxially on (11^^-02) sapphire substrates at above 500℃ by either a dc magnetron sputtering or an electron-beam evaporation method. Prepared Nb films have very flat surface, shorter magnetic penetration depths (λ) and longer superconducting coherence lengths (ξ_ |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Nb film / epitaxial growth / residual resistance ratio / penetration depth / magnetization properties |
Paper # | sce97-17 |
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Conference Information | |
Committee | SCE |
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Conference Date | 1997/7/30(1days) |
Place (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Superconductive Electronics (SCE) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Fabrication and characterization of epitaxial Nb films |
Sub Title (in English) | |
Keyword(1) | Nb film |
Keyword(2) | epitaxial growth |
Keyword(3) | residual resistance ratio |
Keyword(4) | penetration depth |
Keyword(5) | magnetization properties |
1st Author's Name | M. Matsuda |
1st Author's Affiliation | Muroran Institute of Technology() |
2nd Author's Name | M. Matsumoto |
2nd Author's Affiliation | Muroran Institute of Technology |
3rd Author's Name | N. Taneda |
3rd Author's Affiliation | Muroran Institute of Technology |
4th Author's Name | F. Hirayama |
4th Author's Affiliation | Electrotechnical Laboratory |
5th Author's Name | S. Kuriki |
5th Author's Affiliation | Research Institute for Electronic Science, Hokkaido University |
Date | 1997/7/30 |
Paper # | sce97-17 |
Volume (vol) | vol.97 |
Number (no) | 219 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |