Presentation | 2001/11/1 Measuring the thickness and thickness uniformity of ultra-thin AlO_x films in magnetic tunneling junctions by combined RBS and conducting atomic force microscopy E.Z. Luo, S.K. Wong, A.B. Pakhomov, B. Sundaravel, J.B. Xu, I.H. Wilson, C.Y. Wong, |
---|---|
PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | In this article, we present a study to measure average thickness and as well as the thickness uniformity of the ultra-thin AlO_x barrier layer by combined RBS and conducting atomic force microscopy(C-AFM). RBS in tilted angle geometry was used to determine the average thickness on a macroscopic scale. By carefully analyzing the variation of energy width of Al spectra with tilt angle, the average thickness of AlO_x layers has been quantitatively determined. The thickness and thickness uniformity on a microscopic scale was measured by C-AFM. The errors of both techniques will also be discussed. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | RBS / conducting AFM / Magnetic tunneling junctions |
Paper # | MR2001-57 |
Date of Issue |
Conference Information | |
Committee | MR |
---|---|
Conference Date | 2001/11/1(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | |
Vice Chair | |
Secretary | |
Assistant |
Paper Information | |
Registration To | Magnetic Recording (MR) |
---|---|
Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Measuring the thickness and thickness uniformity of ultra-thin AlO_x films in magnetic tunneling junctions by combined RBS and conducting atomic force microscopy |
Sub Title (in English) | |
Keyword(1) | RBS |
Keyword(2) | conducting AFM |
Keyword(3) | Magnetic tunneling junctions |
1st Author's Name | E.Z. Luo |
1st Author's Affiliation | Department of Electronic Engineering, The Chinese University of Hong Kong() |
2nd Author's Name | S.K. Wong |
2nd Author's Affiliation | Materials Characterization and Preparation Facility Hong Kong University of Science and technology |
3rd Author's Name | A.B. Pakhomov |
3rd Author's Affiliation | Materials Characterization and Preparation Facility Hong Kong University of Science and technology |
4th Author's Name | B. Sundaravel |
4th Author's Affiliation | Department of Electronic Engineering, The Chinese University of Hong Kong |
5th Author's Name | J.B. Xu |
5th Author's Affiliation | Department of Electronic Engineering, The Chinese University of Hong Kong |
6th Author's Name | I.H. Wilson |
6th Author's Affiliation | Department of Electronic Engineering, The Chinese University of Hong Kong |
7th Author's Name | C.Y. Wong |
7th Author's Affiliation | Materials Characterization and Preparation Facility Hong Kong University of Science and technology |
Date | 2001/11/1 |
Paper # | MR2001-57 |
Volume (vol) | vol.101 |
Number (no) | 400 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |