Presentation 1995/10/12
Characteristics of the metal -in -gap head with high saturation flux density magnetic film
Hiroyuki Hasegawa, Ken Takahashi, Yoshiyasu Honma, Eisuke Sawai, Makoto Kimura, Kouichi Osano, Masaya Sakaguchi, Tatsutoshi Suenaga,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) It is important for the new multimedia system to achieve the digital VTR, and to carry out this, it is necessary to develop the high performance magnetic heads. We tried to make the metal-in-gap heads with high saturation flux density magnetic film which is formed parallel to the head gap and found that it had both the high productivity and the good magnetic recording characteristics. Strong points of this head are firstly its structure which is suitable for the narrow track pitch recording and reproducing, and secondary its excellent recording ability to the highly coercive ME tape, and thirdly its high reproducing sensitivity achieved by the good selection of the glass material which is optimized by using the three dimensional simulation program of the head efficiency.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) MIG head / saturation flux density / recording characteristics / digital VTR / fringe
Paper # MR95-35
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Committee MR
Conference Date 1995/10/12(1days)
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Registration To Magnetic Recording (MR)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Characteristics of the metal -in -gap head with high saturation flux density magnetic film
Sub Title (in English)
Keyword(1) MIG head
Keyword(2) saturation flux density
Keyword(3) recording characteristics
Keyword(4) digital VTR
Keyword(5) fringe
1st Author's Name Hiroyuki Hasegawa
1st Author's Affiliation Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory()
2nd Author's Name Ken Takahashi
2nd Author's Affiliation Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory
3rd Author's Name Yoshiyasu Honma
3rd Author's Affiliation Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory
4th Author's Name Eisuke Sawai
4th Author's Affiliation Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory
5th Author's Name Makoto Kimura
5th Author's Affiliation Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory
6th Author's Name Kouichi Osano
6th Author's Affiliation Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory
7th Author's Name Masaya Sakaguchi
7th Author's Affiliation Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory
8th Author's Name Tatsutoshi Suenaga
8th Author's Affiliation Matsushita Electric Industrial Co., Ltd. Products Development Engineering Center
Date 1995/10/12
Paper # MR95-35
Volume (vol) vol.95
Number (no) 288
Page pp.pp.-
#Pages 6
Date of Issue