Presentation | 1995/10/12 Characteristics of the metal -in -gap head with high saturation flux density magnetic film Hiroyuki Hasegawa, Ken Takahashi, Yoshiyasu Honma, Eisuke Sawai, Makoto Kimura, Kouichi Osano, Masaya Sakaguchi, Tatsutoshi Suenaga, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | It is important for the new multimedia system to achieve the digital VTR, and to carry out this, it is necessary to develop the high performance magnetic heads. We tried to make the metal-in-gap heads with high saturation flux density magnetic film which is formed parallel to the head gap and found that it had both the high productivity and the good magnetic recording characteristics. Strong points of this head are firstly its structure which is suitable for the narrow track pitch recording and reproducing, and secondary its excellent recording ability to the highly coercive ME tape, and thirdly its high reproducing sensitivity achieved by the good selection of the glass material which is optimized by using the three dimensional simulation program of the head efficiency. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | MIG head / saturation flux density / recording characteristics / digital VTR / fringe |
Paper # | MR95-35 |
Date of Issue |
Conference Information | |
Committee | MR |
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Conference Date | 1995/10/12(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | |
Vice Chair | |
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Assistant |
Paper Information | |
Registration To | Magnetic Recording (MR) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Characteristics of the metal -in -gap head with high saturation flux density magnetic film |
Sub Title (in English) | |
Keyword(1) | MIG head |
Keyword(2) | saturation flux density |
Keyword(3) | recording characteristics |
Keyword(4) | digital VTR |
Keyword(5) | fringe |
1st Author's Name | Hiroyuki Hasegawa |
1st Author's Affiliation | Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory() |
2nd Author's Name | Ken Takahashi |
2nd Author's Affiliation | Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory |
3rd Author's Name | Yoshiyasu Honma |
3rd Author's Affiliation | Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory |
4th Author's Name | Eisuke Sawai |
4th Author's Affiliation | Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory |
5th Author's Name | Makoto Kimura |
5th Author's Affiliation | Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory |
6th Author's Name | Kouichi Osano |
6th Author's Affiliation | Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory |
7th Author's Name | Masaya Sakaguchi |
7th Author's Affiliation | Matsushita Electric Industrial Co., Ltd. Materials and Devices Laboratory |
8th Author's Name | Tatsutoshi Suenaga |
8th Author's Affiliation | Matsushita Electric Industrial Co., Ltd. Products Development Engineering Center |
Date | 1995/10/12 |
Paper # | MR95-35 |
Volume (vol) | vol.95 |
Number (no) | 288 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |