Presentation 1996/3/1
Soft Magnetic and High Magnetostrictive Tb-Ho-Fe System Amorphous Alloy Sputtered Thin Films
Satoru Ishii, Yoshiaki Kurashina, Naoyuki Fujita, Mitsuteru Inoue, Toshitaka Fujii,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We have investigated magnetization and magnetostriction properties of amorphous alloy films of the ternary system Tb_<40-x>Ho_xFe_<60> prepared by rf-magnetron sputtering to develop thin film actuator materials. For this purpose, the materials must equip soft magnetism retaining large magnetostriction to enable small magnetic field drive. It is found that films having magnetic softness (coercivity Hc&cong20Oe) and a considerably large saturation magnetostriction constant λs exceeding 100×10^<-6> can be realized at the composition around x=15at.%.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) soft magnetism / high magnetostriction / amorphous thin film
Paper # MR95-97,CPM95-135
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Committee MR
Conference Date 1996/3/1(1days)
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Registration To Magnetic Recording (MR)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Soft Magnetic and High Magnetostrictive Tb-Ho-Fe System Amorphous Alloy Sputtered Thin Films
Sub Title (in English)
Keyword(1) soft magnetism
Keyword(2) high magnetostriction
Keyword(3) amorphous thin film
1st Author's Name Satoru Ishii
1st Author's Affiliation Toyohashi University of Technology()
2nd Author's Name Yoshiaki Kurashina
2nd Author's Affiliation Toyohashi University of Technology
3rd Author's Name Naoyuki Fujita
3rd Author's Affiliation Osaka Prefectural College of Technology
4th Author's Name Mitsuteru Inoue
4th Author's Affiliation Toyohashi University of Technology
5th Author's Name Toshitaka Fujii
5th Author's Affiliation Toyohashi University of Technology:Tohoku University
Date 1996/3/1
Paper # MR95-97,CPM95-135
Volume (vol) vol.95
Number (no) 549
Page pp.pp.-
#Pages 6
Date of Issue