Presentation 1996/3/1
Influence of Residual Gas on Magnetic Properties of Evaporated Co-O Film
Makoto Iimura, Takashi Kubota, Hiroshi Hirano, Yoichi Ogawa, Tetsuo Mizumura,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We Studied the degradation mechanism of magnetic properties of obliquely evaporeted Co-O film caused by residual gas. It was found that the coercivity(Hc) and squareness ratio(Mr/Ms) decreased with increasing water vapor in residual gas. Higher the water vapor pressure, the more increased easy axis angle from the film plane, and decreased anisotropy field. This suggests the Co vapor scattering by water molecule. In addition, the higher water vapor pressure leads to less oxidation of evaporated Co-O film due to oxygen gas. It is suggested that the strong sticking probability of water molecule to deposition film surface prevents Co film from oxidation.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Co-O obliquely evaporated film / residual gas pressure / water vapor / anisotropy field / axis of easy magnetization
Paper # MR95-92,CPM95-130
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Committee MR
Conference Date 1996/3/1(1days)
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Registration To Magnetic Recording (MR)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Influence of Residual Gas on Magnetic Properties of Evaporated Co-O Film
Sub Title (in English)
Keyword(1) Co-O obliquely evaporated film
Keyword(2) residual gas pressure
Keyword(3) water vapor
Keyword(4) anisotropy field
Keyword(5) axis of easy magnetization
1st Author's Name Makoto Iimura
1st Author's Affiliation Magnetic Media Development Center, Hitachi Maxell, Ltd.()
2nd Author's Name Takashi Kubota
2nd Author's Affiliation Magnetic Media Development Center, Hitachi Maxell, Ltd.
3rd Author's Name Hiroshi Hirano
3rd Author's Affiliation Magnetic Media Development Center, Hitachi Maxell, Ltd.
4th Author's Name Yoichi Ogawa
4th Author's Affiliation Engineering Reserch Laboratory, Hitachi Maxell, Ltd.
5th Author's Name Tetsuo Mizumura
5th Author's Affiliation Engineering Reserch Laboratory, Hitachi Maxell, Ltd.
Date 1996/3/1
Paper # MR95-92,CPM95-130
Volume (vol) vol.95
Number (no) 549
Page pp.pp.-
#Pages 6
Date of Issue