Presentation | 1996/3/1 Influence of Residual Gas on Magnetic Properties of Evaporated Co-O Film Makoto Iimura, Takashi Kubota, Hiroshi Hirano, Yoichi Ogawa, Tetsuo Mizumura, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We Studied the degradation mechanism of magnetic properties of obliquely evaporeted Co-O film caused by residual gas. It was found that the coercivity(Hc) and squareness ratio(Mr/Ms) decreased with increasing water vapor in residual gas. Higher the water vapor pressure, the more increased easy axis angle from the film plane, and decreased anisotropy field. This suggests the Co vapor scattering by water molecule. In addition, the higher water vapor pressure leads to less oxidation of evaporated Co-O film due to oxygen gas. It is suggested that the strong sticking probability of water molecule to deposition film surface prevents Co film from oxidation. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Co-O obliquely evaporated film / residual gas pressure / water vapor / anisotropy field / axis of easy magnetization |
Paper # | MR95-92,CPM95-130 |
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Conference Information | |
Committee | MR |
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Conference Date | 1996/3/1(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | |
Vice Chair | |
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Assistant |
Paper Information | |
Registration To | Magnetic Recording (MR) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Influence of Residual Gas on Magnetic Properties of Evaporated Co-O Film |
Sub Title (in English) | |
Keyword(1) | Co-O obliquely evaporated film |
Keyword(2) | residual gas pressure |
Keyword(3) | water vapor |
Keyword(4) | anisotropy field |
Keyword(5) | axis of easy magnetization |
1st Author's Name | Makoto Iimura |
1st Author's Affiliation | Magnetic Media Development Center, Hitachi Maxell, Ltd.() |
2nd Author's Name | Takashi Kubota |
2nd Author's Affiliation | Magnetic Media Development Center, Hitachi Maxell, Ltd. |
3rd Author's Name | Hiroshi Hirano |
3rd Author's Affiliation | Magnetic Media Development Center, Hitachi Maxell, Ltd. |
4th Author's Name | Yoichi Ogawa |
4th Author's Affiliation | Engineering Reserch Laboratory, Hitachi Maxell, Ltd. |
5th Author's Name | Tetsuo Mizumura |
5th Author's Affiliation | Engineering Reserch Laboratory, Hitachi Maxell, Ltd. |
Date | 1996/3/1 |
Paper # | MR95-92,CPM95-130 |
Volume (vol) | vol.95 |
Number (no) | 549 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |