Presentation 1995/11/23
E-Beam Evaporated Co/Cr and Co/Mo Multilayer Thin Films
S.K. Lee, I.T. Nam, Y.K. Hong,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Co/Cr and Co/Mo multilayer thin films deposited by the e-beam evaporating method have an alternating layered structure. The structure of films with thicker Co layers than Cr and Mo layers are found to be a hcp structure with the c-axis normal to the film plane. The direction of the film plane is the easy magnetization one. There is a no significant difference in shape of hysteresis loops between Co/Cr and Co/Mo multilayer films. Mo layer is more effective than Cr for preparing Co layer with c-axis normal to the film plane.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Co/Cr multilayer / Co/Mo multilayer / E-beam evaporation / hcp / Alternating layered structure / hysteresis loops
Paper # MR95-54
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Committee MR
Conference Date 1995/11/23(1days)
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Registration To Magnetic Recording (MR)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) E-Beam Evaporated Co/Cr and Co/Mo Multilayer Thin Films
Sub Title (in English)
Keyword(1) Co/Cr multilayer
Keyword(2) Co/Mo multilayer
Keyword(3) E-beam evaporation
Keyword(4) hcp
Keyword(5) Alternating layered structure
Keyword(6) hysteresis loops
1st Author's Name S.K. Lee
1st Author's Affiliation Dept. of Materials Science and Engineering, Kangwon National University()
2nd Author's Name I.T. Nam
2nd Author's Affiliation Dept. of Materials Science and Engineering, Kangwon National University
3rd Author's Name Y.K. Hong
3rd Author's Affiliation Oriental Chemicals Industries
Date 1995/11/23
Paper # MR95-54
Volume (vol) vol.95
Number (no) 383
Page pp.pp.-
#Pages 5
Date of Issue