Presentation 1995/11/23
Crystallographic Orientation and Magnetic Properties of Sputtered CoCrTa/CrNi and CoCrTa/CrCu Magnetic Thin Films
C.H. Jeon, I.T. Nam, Y.K. Hong,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) The effect of additional element Cu and Ni into Cr underlayer on a CoCrT/Cr sputterd thin films was investigated. Cu and Ni contents effects on the magnetic and structural properties of CoCrT/Cr was also investigated. The addition of Ni into Cr underlayer made a XRD Peak shift to higher 2θ indicating the decrease of interplanar distance. It has been shown that the intensity and d-value of Cr (110) peak revealed the different tendency for the increase of the content of Cu and Ni. The increase in coercivity may be resulted from the change of Cr underlayer microstructure, leading to the change of CoCrTa magnetic layer microstructure.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Cr underlayer / CoCrTaCrNi Film / CoCrTa/CrCu Film / Coercivity / Interplanar Distance
Paper # MR95-48
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Committee MR
Conference Date 1995/11/23(1days)
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Registration To Magnetic Recording (MR)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Crystallographic Orientation and Magnetic Properties of Sputtered CoCrTa/CrNi and CoCrTa/CrCu Magnetic Thin Films
Sub Title (in English)
Keyword(1) Cr underlayer
Keyword(2) CoCrTaCrNi Film
Keyword(3) CoCrTa/CrCu Film
Keyword(4) Coercivity
Keyword(5) Interplanar Distance
1st Author's Name C.H. Jeon
1st Author's Affiliation Dept. of Materials Science and Engineering, Kangwon National University()
2nd Author's Name I.T. Nam
2nd Author's Affiliation Dept. of Materials Science and Engineering, Kangwon National University
3rd Author's Name Y.K. Hong
3rd Author's Affiliation Oriental Chemical Industries
Date 1995/11/23
Paper # MR95-48
Volume (vol) vol.95
Number (no) 383
Page pp.pp.-
#Pages 5
Date of Issue