Presentation | 1995/11/23 Effects of substrate bias voltage on properties of CoCrTa/Cr media K.J. Lee, S.H. Kim, K.H. Shin, T.D. Lee, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Magnetic properties of CoCrT/Cr thin films deposited with DC bias voltage ranging from 0 to -500V were studied. Three different kinds of biasing schemes were used ; Cr layer bias, Co layer bias, Cr and Co layers bias. In all cases, coercivity increased to a maximum value at -300V bias and decreased with further increasing bias voltage. When Cr layers were biased the cause of coercivity increase could not be interpreted by accounting the intensity change of Co (1011), (1010) and (1120) planes only and it is concluded contribution of Cr morphology change on CoCrTa grain separation must be substantial. The increase of coercivity in the CoCrTa biased specimens is understood as enhanced segregation of Cr with the increasing bias voltage. These and other contributions on the coercivity increment will be discussed in detail. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Magnetic recording media / Substrate bias / CoCrTa/Cr / Cr segregation |
Paper # | MR95-47 |
Date of Issue |
Conference Information | |
Committee | MR |
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Conference Date | 1995/11/23(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
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Chair | |
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Paper Information | |
Registration To | Magnetic Recording (MR) |
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Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Effects of substrate bias voltage on properties of CoCrTa/Cr media |
Sub Title (in English) | |
Keyword(1) | Magnetic recording media |
Keyword(2) | Substrate bias |
Keyword(3) | CoCrTa/Cr |
Keyword(4) | Cr segregation |
1st Author's Name | K.J. Lee |
1st Author's Affiliation | Dept. Advanced Mater. Eng., Korea Advanced Inst. of Sci. & Tech.() |
2nd Author's Name | S.H. Kim |
2nd Author's Affiliation | Dept. Advanced Mater. Eng., Korea Advanced Inst. of Sci. & Tech. |
3rd Author's Name | K.H. Shin |
3rd Author's Affiliation | Div. of Metals, Korea Inst. of Sci. & Tech. |
4th Author's Name | T.D. Lee |
4th Author's Affiliation | Dept. Advanced Mater. Eng., Korea Advanced Inst. of Sci. & Tech. |
Date | 1995/11/23 |
Paper # | MR95-47 |
Volume (vol) | vol.95 |
Number (no) | 383 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |