Presentation 1997/1/23
Effect of a CoO under layer on Co-O films deposited obliquely
Kiyokazu Tohma, Ryuji Sugita, Kazunari Yoshimoto, Tatsuaki Ishida,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) The effect of a CoO under layer on Co-O films deposited obliquely is investigated through magnetic measurements and microstructure observations of the films. The under layer makes the coercivity of the films high. Films with the under layer have high uniaxial magnetic anisotropy along columnar grains, because of the c-axis preferred orientation of hcp-Co. The granular texture of the under layer promotes separation between columnar grains growing obliquely. Additionally, a simple process of continuous deposition is tried out. In the process with a high temperature plate where Co atoms are re-evaporated, both magnetic layer and under layer are fabricated simultaneously at single run of a base film,
Keyword(in Japanese) (See Japanese page)
Keyword(in English) CoO under layer / Co-O films deposited obliquely / coercivity / uniaxial magnetic anisotropy / high temperature plate / re-evaporation
Paper # MR96-85
Date of Issue

Conference Information
Committee MR
Conference Date 1997/1/23(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Magnetic Recording (MR)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Effect of a CoO under layer on Co-O films deposited obliquely
Sub Title (in English)
Keyword(1) CoO under layer
Keyword(2) Co-O films deposited obliquely
Keyword(3) coercivity
Keyword(4) uniaxial magnetic anisotropy
Keyword(5) high temperature plate
Keyword(6) re-evaporation
1st Author's Name Kiyokazu Tohma
1st Author's Affiliation AVC Products Development Laboratory, Matsushita Electric Industrial Co., Ltd.()
2nd Author's Name Ryuji Sugita
2nd Author's Affiliation AVC Products Development Laboratory, Matsushita Electric Industrial Co., Ltd.
3rd Author's Name Kazunari Yoshimoto
3rd Author's Affiliation AVC Products Development Laboratory, Matsushita Electric Industrial Co., Ltd.
4th Author's Name Tatsuaki Ishida
4th Author's Affiliation AVC Products Development Laboratory, Matsushita Electric Industrial Co., Ltd.
Date 1997/1/23
Paper # MR96-85
Volume (vol) vol.96
Number (no) 485
Page pp.pp.-
#Pages 8
Date of Issue