| Presentation | 2001/11/1 Fabrication of a-Si:H avalanche multiplication photodiode films on polycrystalline silicon Masahiro Akiyama, Masaki Hanada, Hidekuni Takao, Kazuaki Sawada, Makoto Ishida, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | An image sensor with high sensitivity and high pixel density is necessary. In order to reconcile these requirements, on avalanche multiplication phtodiode on Si substrate was confirmed. However, other n-type materials are necessary to be united with the a-Si:H photoconductivity film and reading circuit. In the photoconductivity film deposited on the poly-Si n-type material. The surface of the wafer was made smooth by CMP(Chemical Mechanical Polishing). As a result, impurities were diffused and removed from the surface layer by wet oxygen, thereby decreasing the dark current. Sensitivity of light was then increased and a basic characteristic of the pin photoconductivity film was confirmed. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Avalanche pin Photodiode / Stacked-type Image Sensors / Hydrogenated Amorphous Silicon / CMP(Chemical Mechanical Polishing) / Wet Oxygen |
| Paper # | EID2001-43 |
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| Conference Information | |
| Committee | EID |
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| Conference Date | 2001/11/1(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Electronic Information Displays (EID) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication of a-Si:H avalanche multiplication photodiode films on polycrystalline silicon |
| Sub Title (in English) | |
| Keyword(1) | Avalanche pin Photodiode |
| Keyword(2) | Stacked-type Image Sensors |
| Keyword(3) | Hydrogenated Amorphous Silicon |
| Keyword(4) | CMP(Chemical Mechanical Polishing) |
| Keyword(5) | Wet Oxygen |
| 1st Author's Name | Masahiro Akiyama |
| 1st Author's Affiliation | Department of Electrical and Electronic Engineering, Toyohashi University of Technology() |
| 2nd Author's Name | Masaki Hanada |
| 2nd Author's Affiliation | Department of Electrical and Electronic Engineering, Toyohashi University of Technology |
| 3rd Author's Name | Hidekuni Takao |
| 3rd Author's Affiliation | Department of Electrical and Electronic Engineering, Toyohashi University of Technology |
| 4th Author's Name | Kazuaki Sawada |
| 4th Author's Affiliation | Department of Electrical and Electronic Engineering, Toyohashi University of Technology |
| 5th Author's Name | Makoto Ishida |
| 5th Author's Affiliation | Department of Electrical and Electronic Engineering, Toyohashi University of Technology |
| Date | 2001/11/1 |
| Paper # | EID2001-43 |
| Volume (vol) | vol.101 |
| Number (no) | 404 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |