| Presentation | 2000/10/26 Annealing and electroluminescent properties of CaS:Cu, F thin film Shintaro Hakamata, Toru Nakajima, Hiroko Kominami, Yoichiro Nakanishi, Yoshinori Hatanaka, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | CaS:Cu, F thin films were deposited on quartz glass substrates in view of developement of blue-emitting thin film electroluminescent(EL) devices with high luminance and good color purity. In this experiment, dependence of the crystallinity and PL intensity of the CaS:Cu, F films on the annealing temperature and time was studied. It was shown that the crystallinity and PL intensity were increased by annealing at temperatures above 700℃. They were increased by the annealing up to 10 min, but the increase saturated at annealing times longer that 10min, From the seresults, the annealing time of about 10 min sees to be optimum. The thin-film EL device was prepared using Y_2O_3 and ZnS thin films as an insulating and buffer layers, respectively, EL emission with high luminance was not obtained by peeling-off of the films by annealing at higher than 800℃. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | EL / CaS:Cu, F / PL / annealing / thin film / buffer layer |
| Paper # | EID2000-202 |
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| Conference Information | |
| Committee | EID |
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| Conference Date | 2000/10/26(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Electronic Information Displays (EID) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Annealing and electroluminescent properties of CaS:Cu, F thin film |
| Sub Title (in English) | |
| Keyword(1) | EL |
| Keyword(2) | CaS:Cu, F |
| Keyword(3) | PL |
| Keyword(4) | annealing |
| Keyword(5) | thin film |
| Keyword(6) | buffer layer |
| 1st Author's Name | Shintaro Hakamata |
| 1st Author's Affiliation | Research Institute of Electronics, Shizuoka University() |
| 2nd Author's Name | Toru Nakajima |
| 2nd Author's Affiliation | Research Institute of Electronics, Shizuoka University |
| 3rd Author's Name | Hiroko Kominami |
| 3rd Author's Affiliation | Graduate School of Electronic Science and Technology, Shizuoka University |
| 4th Author's Name | Yoichiro Nakanishi |
| 4th Author's Affiliation | Research Institute of Electronics, Shizuoka University:Graduate School of Electronic Science and Technology, Shizuoka University |
| 5th Author's Name | Yoshinori Hatanaka |
| 5th Author's Affiliation | Research Institute of Electronics, Shizuoka University:Graduate School of Electronic Science and Technology, Shizuoka University |
| Date | 2000/10/26 |
| Paper # | EID2000-202 |
| Volume (vol) | vol.100 |
| Number (no) | 404 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |