Presentation 2000/6/15
Expermental and Theoretical Studies of Reactive Sputtering Prosess for MgO Film Deposition
Yoshinobu Matsuda, Koji Ohtomo, Hiroshi Fujiyama,
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Abstract(in English) Preparation of MgO thin films using reactive magnetron sputtering of Mg target in argon/ oxygen mixture is fascinating with respect to decreased process cost and improved film quality, irrespective of its small deposition rate. Fabrication and control of MgO films by this process was studied experimentally and theoretically. First, the experimental results of mode transition observed in sputter-deposition property associated with the discharge property are reported. Next, a reactive sputtering model considering the particle balance of oxygen as well as the change in secondary electron emission coefficient on the target is shown. Based on them, quantitative and systematic modeling of reactive sputtering of Mg target is discussed.
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Keyword(in English) MgO / reactive sputtering / mode transition / modeling / secondary electron emission
Paper # EID2000-7
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Committee EID
Conference Date 2000/6/15(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Expermental and Theoretical Studies of Reactive Sputtering Prosess for MgO Film Deposition
Sub Title (in English)
Keyword(1) MgO
Keyword(2) reactive sputtering
Keyword(3) mode transition
Keyword(4) modeling
Keyword(5) secondary electron emission
1st Author's Name Yoshinobu Matsuda
1st Author's Affiliation Department of Electrical and Electronic Engineering, Nagasaki University()
2nd Author's Name Koji Ohtomo
2nd Author's Affiliation Department of Electrical and Electronic Engineering, Nagasaki University
3rd Author's Name Hiroshi Fujiyama
3rd Author's Affiliation Department of Electrical and Electronic Engineering, Nagasaki University
Date 2000/6/15
Paper # EID2000-7
Volume (vol) vol.100
Number (no) 132
Page pp.pp.-
#Pages 6
Date of Issue