Presentation | 1999/7/9 Optimaization of preparing conditions of high-luminance TFEL devices using Ga_20_3:Mn thin films prepared by magnetron sputtering Toshihiro MIYATA, Toshikuni NAKATANI, Tadatsugu MINAMI, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | High-luminance green-emitting TFEL devices have been fabricated using a Ga_2O_3:Mn phosphor thin-film emitting layer and a thick BaTiO_3 ceramic sheet insulating layer. The EL characteristics of TFEL devices with a Ga_2O_3: Mn phosphor thin-film emitting layer prepared by rf magnetron sputtering were strongly dependent on the preparing conditions of Ga_2O_3:Mn thin-film. A lumirtance of 7.54cd/m^2 was obtained in a green-emitting TFEL device with an as-deposited Ga_2O_3:Mn phosphor thin-film emitting layer prepared at substrate temperature of 365℃. High luminaces of 627 and 167 cd/m^2 were obtained in a device using Ga_2O_3: Mn phosphor thin-film postannealed at 1020℃ and prepared at substrate temperature of 390℃, when driven at 1kHz and 60Hz, respectively. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | electroluminescence / Ga_2O_3:Mn / rf magnetron sputtering / oxide phosphor / TFEL device |
Paper # | EID99-44 |
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Conference Information | |
Committee | EID |
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Conference Date | 1999/7/9(1days) |
Place (in Japanese) | (See Japanese page) |
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Registration To | Electronic Information Displays (EID) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Optimaization of preparing conditions of high-luminance TFEL devices using Ga_20_3:Mn thin films prepared by magnetron sputtering |
Sub Title (in English) | |
Keyword(1) | electroluminescence |
Keyword(2) | Ga_2O_3:Mn |
Keyword(3) | rf magnetron sputtering |
Keyword(4) | oxide phosphor |
Keyword(5) | TFEL device |
1st Author's Name | Toshihiro MIYATA |
1st Author's Affiliation | Electron Device System Laboratory, Kanazawa Institute of Technology() |
2nd Author's Name | Toshikuni NAKATANI |
2nd Author's Affiliation | Electron Device System Laboratory, Kanazawa Institute of Technology |
3rd Author's Name | Tadatsugu MINAMI |
3rd Author's Affiliation | Electron Device System Laboratory, Kanazawa Institute of Technology |
Date | 1999/7/9 |
Paper # | EID99-44 |
Volume (vol) | vol.99 |
Number (no) | 171 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |