Presentation 1999/7/9
An Oxide Cathode with Tungsten-film Coating
Hiroyuki Teramoto, Masato Saito, Takuya Ohira, Shoyu Watanabe, Takashi Shinjo,
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Abstract(in English) The improved Sc_20_3-dispersed-oxide-cathode with Tungsten-Film Coating has been developed. The capability of new cathode for high current density operation is as high as 1.5 times that of conventional Sc_20_3-dispersed-oxide-cathode. Ni and W interdiffuse and form a fine-grained and uneven Ni-W layer. This structure increases the opportunity for reaction. Sufficient free Ba is also formed within this structure. Ba_2Si0_4 (an insulator) is dispersed in the Ni-W layer. As a result, Si, Mg and W of the proper quantity in the Ni-W layer seem to contribute to free Ba production during long operation.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) CRT / oxide cathode / tungsten / current density / diffusion / reduction
Paper # EID99-42
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Committee EID
Conference Date 1999/7/9(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) An Oxide Cathode with Tungsten-film Coating
Sub Title (in English)
Keyword(1) CRT
Keyword(2) oxide cathode
Keyword(3) tungsten
Keyword(4) current density
Keyword(5) diffusion
Keyword(6) reduction
1st Author's Name Hiroyuki Teramoto
1st Author's Affiliation Advanced Technology R&D center Mitsubishi Electric Corporation()
2nd Author's Name Masato Saito
2nd Author's Affiliation Advanced Technology R&D center Mitsubishi Electric Corporation
3rd Author's Name Takuya Ohira
3rd Author's Affiliation Advanced Technology R&D center Mitsubishi Electric Corporation
4th Author's Name Shoyu Watanabe
4th Author's Affiliation Advanced Technology R&D center Mitsubishi Electric Corporation
5th Author's Name Takashi Shinjo
5th Author's Affiliation Display Devices Business Division Mitsubishi Electric Corporation
Date 1999/7/9
Paper # EID99-42
Volume (vol) vol.99
Number (no) 171
Page pp.pp.-
#Pages 6
Date of Issue