講演名 | 1999/3/19 SIMULATION OF MASK DESIGN , |
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PDFダウンロードページ | PDFダウンロードページへ |
抄録(和) | |
抄録(英) | A simulalion program of CRT design, specially focused on mask design, is proposed in the present study. Incorporating the back-tracing results of exposure system along with three-dimensional special geometric relations, the weighted least square method is applied to solve the characteristics of each R-G-B trio in full screen. The nesting arrangement for full screen is obtained by setting a flat mask pattern, included as horizontal/vertical pitches and aperture size. In the same manner, the landing distribution of electron beam could be found by inputting the magnitude of misregistrations. The improvement of mask design is judged according to the increase in the guard-band of nesting distribution. Graphic User Interface (GUI) is another target in this work. Within GUI environment design engineers can comfortably operate the simulation system to input mentioned design parameters, such as: flat mask pattern, formed mask geometry, q spacing, etc. Also, the simulation results, both R-G-B trio and nesting arrangement, can be shown graphically. |
キーワード(和) | |
キーワード(英) | Weighted Least Square Method / R-G-B Trio / Nesting / Mask design / Simulation / GUI |
資料番号 | EID98-245 |
発行日 |
研究会情報 | |
研究会 | EID |
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開催期間 | 1999/3/19(から1日開催) |
開催地(和) | |
開催地(英) | |
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テーマ(英) | |
委員長氏名(和) | |
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副委員長氏名(英) | |
幹事氏名(和) | |
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幹事補佐氏名(和) | |
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講演論文情報詳細 | |
申込み研究会 | Electronic Information Displays (EID) |
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本文の言語 | ENG |
タイトル(和) | |
サブタイトル(和) | |
タイトル(英) | SIMULATION OF MASK DESIGN |
サブタイトル(和) | |
キーワード(1)(和/英) | / Weighted Least Square Method |
第 1 著者 氏名(和/英) | / Wen-Chi Chen |
第 1 著者 所属(和/英) | CRT R&D Division, ChungHwa Picture Tubes. Ltd. |
発表年月日 | 1999/3/19 |
資料番号 | EID98-245 |
巻番号(vol) | vol.98 |
号番号(no) | 666 |
ページ範囲 | pp.- |
ページ数 | 5 |
発行日 |