Presentation | 1999/3/18 The Implication of Thermal Compaction on Hot Forming Technology for AMLCD Glass Shi-How Shieh, Hsien-Hui Tai, Hsiu-Chin Hsieh, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Silicate glass is the primary candidate for AMLCD substrates. Stringent pristine surface requirement has limited its commercial production to within a few companies, each of which uses different not forming technique. Thermal compaction and structure relaxation studies revealed different thermal history experienced by the substrate during manufacturing. Tests shown higher expansion OA2 has less compaction than 1737 indicating a much lower sheet forming temperature than 1737. While newer OA10 and 1737 are practically inter-changeable with one another, having many similarities in their their thermal mechanical properties. Data supports the possibility of inter-changing different brand glasses for either color filter or TFT. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Glass / Substrate / Structure relaxation / Thermal compaction / Liquid crystal |
Paper # | EID98-212 |
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Conference Information | |
Committee | EID |
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Conference Date | 1999/3/18(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Electronic Information Displays (EID) |
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Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | The Implication of Thermal Compaction on Hot Forming Technology for AMLCD Glass |
Sub Title (in English) | |
Keyword(1) | Glass |
Keyword(2) | Substrate |
Keyword(3) | Structure relaxation |
Keyword(4) | Thermal compaction |
Keyword(5) | Liquid crystal |
1st Author's Name | Shi-How Shieh |
1st Author's Affiliation | Dept of Inorganic and Solid State Chemistry Applied Chemistry Division, UCL, ITRI() |
2nd Author's Name | Hsien-Hui Tai |
2nd Author's Affiliation | Dept of Inorganic and Solid State Chemistry Applied Chemistry Division, UCL, ITRI |
3rd Author's Name | Hsiu-Chin Hsieh |
3rd Author's Affiliation | Dept of Inorganic and Solid State Chemistry Applied Chemistry Division, UCL, ITRI |
Date | 1999/3/18 |
Paper # | EID98-212 |
Volume (vol) | vol.98 |
Number (no) | 665 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |