Presentation | 1999/1/22 Blue Emitting SrS : Cu Thin Films EL Prepared by Electron Beams Evaporation Method : Effect of Cu Concentration and Post-annealing Kunihiro Kita, Haruki Fukada, Koutoku Ohmi, Shosaku Tanaka, Hiroshi Kobayashi, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | SrS : Cu, Cl thin fikms have been prepared by electron beam evaporation method. After deposition, thin films have been annealed at 700 and 900℃ for 5 minutes in Ar. The crystallinity of the SrS : Cu, Cl thin films is improved by adding Ga and Cl. The crystallinity of the films is further improved by the postannealing. The films prepared using the source pellet having Cu concentration of 0.1 mol% shows the photoluminescent(PL)emission peaking at 500 nm. The peak wavelength of the PL spectra shifts to 520 nm by increasing Cu concentration. The PL intensity is significantly increased by the annealing, however the spectra are not changed. The effect of post-annealing is thought to be not change of crystal field around Cu^+ centers but improvement of crystallinity of SrS lattices. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Blue emitting EL materials / SrS : Cu / Photoluminescence / Post-annealing |
Paper # | EID98-116 |
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Conference Information | |
Committee | EID |
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Conference Date | 1999/1/22(1days) |
Place (in Japanese) | (See Japanese page) |
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Registration To | Electronic Information Displays (EID) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Blue Emitting SrS : Cu Thin Films EL Prepared by Electron Beams Evaporation Method : Effect of Cu Concentration and Post-annealing |
Sub Title (in English) | |
Keyword(1) | Blue emitting EL materials |
Keyword(2) | SrS : Cu |
Keyword(3) | Photoluminescence |
Keyword(4) | Post-annealing |
1st Author's Name | Kunihiro Kita |
1st Author's Affiliation | Department of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University() |
2nd Author's Name | Haruki Fukada |
2nd Author's Affiliation | Department of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University |
3rd Author's Name | Koutoku Ohmi |
3rd Author's Affiliation | Department of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University |
4th Author's Name | Shosaku Tanaka |
4th Author's Affiliation | Department of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University |
5th Author's Name | Hiroshi Kobayashi |
5th Author's Affiliation | Department of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University |
Date | 1999/1/22 |
Paper # | EID98-116 |
Volume (vol) | vol.98 |
Number (no) | 550 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |