Presentation 1999/1/21
Analysis of secondary electron emission yield of MgO thin films
Manabu Ishimoto, Souichiro Hidaka, Keiichi Betsui, Tutae Shinoda,
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Abstract(in English) We successfully measured the secondary electron emission yield(γ)of MgO thin films for protecting layer of AC-PDP. We made the measurement apparatus with which we could measure the γ in high stability. The variation of repeating measurement and the long-time(1 hour)measurement were within 5%. With this apparatus, we measured the heat treatment effect on γ, and the relationship between γ and the acceleration voltage of induced ion. And we also measured the energy distribution of secondary electrons from metal(copper)and MgO to investigate the electron emission process. We investigated the difference of the distribution between the metal and non-conductive material, and we discuss the surface charge effect on the distribution.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) MgO / AC-PDP / γ / protecting layer / secondary electron
Paper # EID98-107
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Committee EID
Conference Date 1999/1/21(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Analysis of secondary electron emission yield of MgO thin films
Sub Title (in English)
Keyword(1) MgO
Keyword(2) AC-PDP
Keyword(3) γ
Keyword(4) protecting layer
Keyword(5) secondary electron
1st Author's Name Manabu Ishimoto
1st Author's Affiliation Fujitsu Laboratories LTD.()
2nd Author's Name Souichiro Hidaka
2nd Author's Affiliation Fujitsu Laboratories LTD.
3rd Author's Name Keiichi Betsui
3rd Author's Affiliation Fujitsu Laboratories LTD.
4th Author's Name Tutae Shinoda
4th Author's Affiliation Fujitsu Laboratories LTD.
Date 1999/1/21
Paper # EID98-107
Volume (vol) vol.98
Number (no) 549
Page pp.pp.-
#Pages 5
Date of Issue