Presentation 1999/1/21
Emission Current Controllable Si Field Emitter
K. Ozawa, K. Tokunaga, S. Kanemaru, T. Matsukawa, J. Itoh,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) A new Si field emitter tip with metal-oxide-semiconductor field-effect-transistor(MOSFET)structure was fabricated and demonstrated. In the present device, a well-sharpened Si tip was made junst on the drain of the MOSFET and two gates were made of poly-Si layer between the drain and the source. Among the gates, the one having an aperture surrounding the tip was mainly used as an extraction electrode and the other was used as an FET gate. By employing the poly-Si gates, the fabrication process was optimized especially in the activation temperature after ion implantation doping and consequently, the MOSFET characteristics was much improved. The fabrication process and emission characteristics are described in detail.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) FED / Field Emitter / MOSFET / Poly-Si Gate / LSI
Paper # EID98-93
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Conference Date 1999/1/21(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Emission Current Controllable Si Field Emitter
Sub Title (in English)
Keyword(1) FED
Keyword(2) Field Emitter
Keyword(3) MOSFET
Keyword(4) Poly-Si Gate
Keyword(5) LSI
1st Author's Name K. Ozawa
1st Author's Affiliation Musashi Institute of Technology()
2nd Author's Name K. Tokunaga
2nd Author's Affiliation Tokai University
3rd Author's Name S. Kanemaru
3rd Author's Affiliation Electrotechnical Laboratry
4th Author's Name T. Matsukawa
4th Author's Affiliation Electrotechnical Laboratry
5th Author's Name J. Itoh
5th Author's Affiliation Electrotechnical Laboratry
Date 1999/1/21
Paper # EID98-93
Volume (vol) vol.98
Number (no) 549
Page pp.pp.-
#Pages 6
Date of Issue