Presentation | 1998/6/25 Characteristics of laser-annealed polycrystalline silicon films Yasuyoshi Mishima, Katsuyuki Suga, Fumiyo Takeuchi, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Excimer laser-annealed polycrystalline silicon (poly-Si) films have been investigated. The uniformity of these films was mainly determined by pulse-to-pulse laser energy fluctuations and beam profiles. The native oxide of a-Si films also influenced the surface roughness of poly-Si films. The fluctuation of crystallinity in the threshold region exerts a strong influence on the TFT characteristics. Because the crystallinity of laser-annealed poly-Si has a narrow threshold energy region, the improvement of the uniformity of the TFT characteristics is needed more exact control of crystallization parameters. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Excimer laser / crystallinity / grain size / surface roughness / uniformity |
Paper # | EID98-19 |
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Conference Information | |
Committee | EID |
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Conference Date | 1998/6/25(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
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Paper Information | |
Registration To | Electronic Information Displays (EID) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Characteristics of laser-annealed polycrystalline silicon films |
Sub Title (in English) | |
Keyword(1) | Excimer laser |
Keyword(2) | crystallinity |
Keyword(3) | grain size |
Keyword(4) | surface roughness |
Keyword(5) | uniformity |
1st Author's Name | Yasuyoshi Mishima |
1st Author's Affiliation | Fujitsu laboratories Ltd. Electron Devices and Materials Lab. LCD Lab.() |
2nd Author's Name | Katsuyuki Suga |
2nd Author's Affiliation | Fujitsu laboratories Ltd. Electron Devices and Materials Lab. LCD Lab. |
3rd Author's Name | Fumiyo Takeuchi |
3rd Author's Affiliation | Fujitsu laboratories Ltd. Electron Devices and Materials Lab. LCD Lab. |
Date | 1998/6/25 |
Paper # | EID98-19 |
Volume (vol) | vol.98 |
Number (no) | 151 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |