Presentation 1994/12/8
Report on 1994 IDRC : Processes and materials for Active Matrix LCD
Akio Mimura,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) This report reviews the papers about the active-matrix LCD process and material technologies(session 1,2,7)in 1994 IDRC.In AM process technologies,poly-Si TFT by using laser and thermal annealing(4 papers),poly-CdSe TFT(1),low-resistance metallization(4),process step analysis(1),pixel defect tolerant design(1)are presented.In material technologies,liquid crystal and alignment materials(3),color filter material(1)are reviewed.The topics are laser crystallization technologies for the large glass substrates and low resistance gate metallization technologies for large area and high resolution AM-LCD.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) IDRC'94 / active-matrix / poly-Si TFT / laser / metallization / liquid crystal
Paper # EID94-96
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Conference Information
Committee EID
Conference Date 1994/12/8(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Report on 1994 IDRC : Processes and materials for Active Matrix LCD
Sub Title (in English)
Keyword(1) IDRC'94
Keyword(2) active-matrix
Keyword(3) poly-Si TFT
Keyword(4) laser
Keyword(5) metallization
Keyword(6) liquid crystal
1st Author's Name Akio Mimura
1st Author's Affiliation Hitachi Research Labratory,Hitachi Ltd.()
Date 1994/12/8
Paper # EID94-96
Volume (vol) vol.94
Number (no) 382
Page pp.pp.-
#Pages 6
Date of Issue