| Presentation | 1998/1/29 Fabrication Process of Self-Aligned Organic EL Devices with Side-Wall Structure Toshiaki TERASHITA, Shigeki NAKA, Hiroyuki OKADA, Hiroyoshi ONNAGAWA, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Fabrication process of self-aligned organic EL devices with side-wall structure have been investigated. Principal point of the process is the formation of side-wall structure using reactive ion etching. Cathode was used as a mask for self-alignment and the insulating side-wall structure was formed around periphery of the device. The device characteristics was measured after side-wall fabrication. Emission was observed above 3.5V and was 1000cd/m^2 at 100mA/cm^2. After the side-wall process, wet-and photolithographic-processes could be applied. The emission have been also confirmed after final fabrication process. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | organic EL devices / side-wall structure / self-aligned / photolithography |
| Paper # | EID97-81 |
| Date of Issue |
| Conference Information | |
| Committee | EID |
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| Conference Date | 1998/1/29(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Electronic Information Displays (EID) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication Process of Self-Aligned Organic EL Devices with Side-Wall Structure |
| Sub Title (in English) | |
| Keyword(1) | organic EL devices |
| Keyword(2) | side-wall structure |
| Keyword(3) | self-aligned |
| Keyword(4) | photolithography |
| 1st Author's Name | Toshiaki TERASHITA |
| 1st Author's Affiliation | Faculty of Engineering, Toyama University() |
| 2nd Author's Name | Shigeki NAKA |
| 2nd Author's Affiliation | Faculty of Engineering, Toyama University |
| 3rd Author's Name | Hiroyuki OKADA |
| 3rd Author's Affiliation | Faculty of Engineering, Toyama University |
| 4th Author's Name | Hiroyoshi ONNAGAWA |
| 4th Author's Affiliation | Faculty of Engineering, Toyama University |
| Date | 1998/1/29 |
| Paper # | EID97-81 |
| Volume (vol) | vol.97 |
| Number (no) | 519 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |