Presentation | 1996/11/1 A new ionplating process for transparent electrically conductive indium tin oxide (ITO) films Kiyoshi Awai, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | A new ionplating (URT-IP) process using an unique plasma beam control system for gradient- pressure type plasma source that generate highly dense arc plasma, which enables uniformly coating in large area. This technique has a powerful potential of high speed deposition of a variety of thin film materials. Particularly attractive attention is focused on the coating of transparent electrically conductive tin-doped indium oxide (ITO) films for flat panel displays (FPD). The prototype machine has demonstrated the attractive data, lower resistivity, lower substrate temperature and higher deposition rate compared to sputtering process, which has proved the competitiveness of the process in FPD applications. The first machine for commercial use in 1997 is intended to be the starter of replacing conventional machines based on sputtering system. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | ionplating / transparent conductive films (ITO) / plasma / flat panel display / low resistivity |
Paper # | EID96-58 |
Date of Issue |
Conference Information | |
Committee | EID |
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Conference Date | 1996/11/1(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | |
Vice Chair | |
Secretary | |
Assistant |
Paper Information | |
Registration To | Electronic Information Displays (EID) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | A new ionplating process for transparent electrically conductive indium tin oxide (ITO) films |
Sub Title (in English) | |
Keyword(1) | ionplating |
Keyword(2) | transparent conductive films (ITO) |
Keyword(3) | plasma |
Keyword(4) | flat panel display |
Keyword(5) | low resistivity |
1st Author's Name | Kiyoshi Awai |
1st Author's Affiliation | Sumitomo Heavy Industries, Ltd. PLANNING DEPARTMENT CORPOLATE TECHNOLOGY OPERATIONS GROUP() |
Date | 1996/11/1 |
Paper # | EID96-58 |
Volume (vol) | vol.96 |
Number (no) | 341 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |