Presentation 1997/2/14
APPLICATIONS OF CHEMICAL-MECHANICAL-POLISHING PROCESS TO SILICON FIELD EMITTER ARRAY
Jin Ho Lee, Yoon-Ho Song, Sung Weon Kang, Byoung Gon Yu, Kyoung Ik Cho, Sang Yun Lee, Hyung Joun Yoo,
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Abstract(in English) We have fabricated and characterized silicon field emitter arrays by Chemical-Mechanicai-Polishil1g (CMP) process for a clearly cutted gate electrode that was exactly aligned to the emitter. A very high etching selectivity (> 200:1) between the gate electrode and the dielectric was used for preventing the tip from etching off during the CMP. Furthermore, focusing electrodes were also fabricated by the CMP process.
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Paper # EID96-143
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Committee EID
Conference Date 1997/2/14(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
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Title (in English) APPLICATIONS OF CHEMICAL-MECHANICAL-POLISHING PROCESS TO SILICON FIELD EMITTER ARRAY
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1st Author's Name Jin Ho Lee
1st Author's Affiliation Semiconductor Technology Div., Electronics and Telecommunications Research Institute()
2nd Author's Name Yoon-Ho Song
2nd Author's Affiliation Semiconductor Technology Div., Electronics and Telecommunications Research Institute
3rd Author's Name Sung Weon Kang
3rd Author's Affiliation Semiconductor Technology Div., Electronics and Telecommunications Research Institute
4th Author's Name Byoung Gon Yu
4th Author's Affiliation Semiconductor Technology Div., Electronics and Telecommunications Research Institute
5th Author's Name Kyoung Ik Cho
5th Author's Affiliation Semiconductor Technology Div., Electronics and Telecommunications Research Institute
6th Author's Name Sang Yun Lee
6th Author's Affiliation Department of Physics, Kyungpook National University
7th Author's Name Hyung Joun Yoo
7th Author's Affiliation Semiconductor Technology Div., Electronics and Telecommunications Research Institute
Date 1997/2/14
Paper # EID96-143
Volume (vol) vol.96
Number (no) 518
Page pp.pp.-
#Pages 2
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