Presentation 1995/10/20
Calculation of Two-dimensional Optical Image by Diffraction Theory
Masaki HASHIMOTO, Masayuki OODO, Makoto ANDO,
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Abstract(in English) In optical lithography used in the process of producing a semiconductor integrated circuit, various methods to get a high integration have been developed, such as a circular illumination as a light source or a phaseshifting mask to avoid an effect of adjacent circuit patterns. Essentially, a distortion of the image is thought to come from diffracted rays from mask edges when desired circuit patterns get smaller. Thus we introduced a Modified Edge Representation, an electromagnetic diffraction theory used in an antenna engineering, into a ray tracing for diffracted rays from a light source to an image.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) optical lithography / electromagnetic diffraction theory / Modified Edge Representation / ray tracing
Paper # A-P95-68,RCS95-93
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Conference Date 1995/10/20(1days)
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Registration To Antennas and Propagation (A・P)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Calculation of Two-dimensional Optical Image by Diffraction Theory
Sub Title (in English)
Keyword(1) optical lithography
Keyword(2) electromagnetic diffraction theory
Keyword(3) Modified Edge Representation
Keyword(4) ray tracing
1st Author's Name Masaki HASHIMOTO
1st Author's Affiliation Department of Electrical and Electronic Engineering Faculty of Engineering, Tokyo Institute of Technology()
2nd Author's Name Masayuki OODO
2nd Author's Affiliation Department of Electrical and Electronic Engineering Faculty of Engineering, Tokyo Institute of Technology
3rd Author's Name Makoto ANDO
3rd Author's Affiliation Department of Electrical and Electronic Engineering Faculty of Engineering, Tokyo Institute of Technology
Date 1995/10/20
Paper # A-P95-68,RCS95-93
Volume (vol) vol.95
Number (no) 311
Page pp.pp.-
#Pages 6
Date of Issue