Presentation 2001/6/29
Long-wavelength InAs quantum-dot laser on InP substrate
Hideaki Saito, Kenichi Nishi, Shigeo Sugou,
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Abstract(in English) Molecular beam epitaxy was used to grow self-assembled InAs quantum dots on InAl(Ga)As buffer layer/InP(311)B substrates. Their area density was a very high 9×10^<10> cm^<-2> and their room-temperature photoluminescence emission was at 1.6 μm. Emission intensity and emission linewidth showed little degradation in the temperature range from 77 K to 300 K. We fabricated lasers using five-period stacked InAs quantum-dot layers for the active region, and achieved 1.6-μm ground-state lasing with a low threshold current density of 380 A/cm^2. And we operated a quantum dot laser with 0.5-mm-cavity at 20-mA threshold current under continuous wave current.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) quantum dot laser / MBE / self-assembled dot / InAs / InP substrate / WDM
Paper # OPE2001-32,LQE2001-31
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Committee LQE
Conference Date 2001/6/29(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Long-wavelength InAs quantum-dot laser on InP substrate
Sub Title (in English)
Keyword(1) quantum dot laser
Keyword(2) MBE
Keyword(3) self-assembled dot
Keyword(4) InAs
Keyword(5) InP substrate
Keyword(6) WDM
1st Author's Name Hideaki Saito
1st Author's Affiliation Photonic and Wireless Devices Research Laboratories, NEC Corporation()
2nd Author's Name Kenichi Nishi
2nd Author's Affiliation Photonic and Wireless Devices Research Laboratories, NEC Corporation
3rd Author's Name Shigeo Sugou
3rd Author's Affiliation Photonic and Wireless Devices Research Laboratories, NEC Corporation
Date 2001/6/29
Paper # OPE2001-32,LQE2001-31
Volume (vol) vol.101
Number (no) 174
Page pp.pp.-
#Pages 6
Date of Issue