Presentation 2001/6/8
High reflective GaN/Al_<0.6>Ga_<0.4>N distributed Bragg reflector for VCSEL
Naoyuki Nakada, Hiroyasu Ishikawa, Takashi Egawa, Takashi Jimbo, Masayoshi Umeno,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) GaN/AlGaN distributed Bragg reflectors (DBR) were grown under the low-pressure condition by MOCVD. Those structures were fabricated on the atmospheric pressure grown GaN layer on sapphire substrate. The Al content of AIGaN was estimated O.6 by X-ray dirfraction. The flat surfaces without cracks were succcssfully obtained for the growth of GaN/Al_<0.6>Ga_<0.4>N DBR. For 45.5 pairs, the peak reflectivity of over 98 % was obtained at a wavelength of 421 nm.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / AIGaN / MOCVD / LP-MOCVD / DBR / VCSEL
Paper # LQE2001-28
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Committee LQE
Conference Date 2001/6/8(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) High reflective GaN/Al_<0.6>Ga_<0.4>N distributed Bragg reflector for VCSEL
Sub Title (in English)
Keyword(1) GaN
Keyword(2) AIGaN
Keyword(3) MOCVD
Keyword(4) LP-MOCVD
Keyword(5) DBR
Keyword(6) VCSEL
1st Author's Name Naoyuki Nakada
1st Author's Affiliation Department of Electrical and Computer Engineering,Nagoya Institute of Technology()
2nd Author's Name Hiroyasu Ishikawa
2nd Author's Affiliation Research Center for Micro-Structure Devices,Nagoya Institute of Technology
3rd Author's Name Takashi Egawa
3rd Author's Affiliation Research Center for Micro-Structure Devices,Nagoya Institute of Technology
4th Author's Name Takashi Jimbo
4th Author's Affiliation Department of Environmental Technology and Urban Planning,Nagoya Institute of Technology
5th Author's Name Masayoshi Umeno
5th Author's Affiliation Department of Electronics Engineering, Chubu University
Date 2001/6/8
Paper # LQE2001-28
Volume (vol) vol.101
Number (no) 113
Page pp.pp.-
#Pages 6
Date of Issue