Presentation 2001/5/11
Wavelength conversion by Silica Glass
Akihiro Kameyama, Athushi Yokotani, Kou Kurosawa,
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Abstract(in English) We have demonstrated large second-order optical nonlinearity is generated in thermally poled high-purity silica glass that is exposed to KrF excimer laser pulses before the poling. The maximum χ_<33>^<(2)> value is 0.71pm/V in the sample annealed to 900℃ in air, namely introduced to O_2 molecules. A further interesting point is that KrF excimer laser pulses erase the nonlinearity induced in the glasses too. Based on the detailed studies on the laser irradiation effects on the generation an erasure processes, and also optical absorption and luminescence, we show that point defects of ≡Si-O^- play a key role for the nonlinearity formation in the poled high-purity sihca glass.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Silica glass / Second-order optical nonlinearity / thermal poling / KrF excimer laser irradiation
Paper # LQE2001-2
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Committee LQE
Conference Date 2001/5/11(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Wavelength conversion by Silica Glass
Sub Title (in English)
Keyword(1) Silica glass
Keyword(2) Second-order optical nonlinearity
Keyword(3) thermal poling
Keyword(4) KrF excimer laser irradiation
1st Author's Name Akihiro Kameyama
1st Author's Affiliation Faculty of Engineering, Miyazaki University()
2nd Author's Name Athushi Yokotani
2nd Author's Affiliation Faculty of Engineering, Miyazaki University
3rd Author's Name Kou Kurosawa
3rd Author's Affiliation Faculty of Engineering, Miyazaki University
Date 2001/5/11
Paper # LQE2001-2
Volume (vol) vol.101
Number (no) 65
Page pp.pp.-
#Pages 5
Date of Issue