Presentation 2000/1/18
Variable attenuation slope compensator(VASC)using silica-based planar lightwave circuit technology for active gain slope control in EDFAs
Chisai Hirose, Haruo Nakaji, Motoki Kakui, Hitoshi Hatayama, Kenji Koyama, Nobuhiro Akasaka, Masayuki Nishimura,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We propose a novel planar lightwave circuit (PLC)-based device called variable attenuation slope compensator(VASC)specifically designed for use inside the EDFA. The VASC is an electrically controllable optical attenuator whose attenuation slope(wavelength dependence of attenuation)is variable while the average attenuation within the operational wavelength range is unchanged. The VASC consists of two asymmetrical Mach-Zehnder interferometers. The attenuation slope between 1535nm and 1565nm varies from -5.5dB to +6.7dB. The EDFAs employing the VASC have exhibited a dynamic range as large as 20dB and dynamic gain tilt as small as 0.6dB. The noise figure of the EDFA employing the VASC is about 4dB for an iuput level of -28dBm/ch, and it increases by about 9dB whiles the input level is increased by 20dB. This deterioration of the noise figure in the EDFAs employing the VASC is smaller than that observed in the EDFA employing a variable optical attenuator.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) WDM / EDFA / ALC / VASC / DGT
Paper # PS99-70, OPE99-118, LQE99-109
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Conference Information
Committee LQE
Conference Date 2000/1/18(1days)
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Paper Information
Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Variable attenuation slope compensator(VASC)using silica-based planar lightwave circuit technology for active gain slope control in EDFAs
Sub Title (in English)
Keyword(1) WDM
Keyword(2) EDFA
Keyword(3) ALC
Keyword(4) VASC
Keyword(5) DGT
1st Author's Name Chisai Hirose
1st Author's Affiliation Yokohama Research Laboratories, Sumitomo Electric Industries, Ltd.()
2nd Author's Name Haruo Nakaji
2nd Author's Affiliation Yokohama Research Labratories, Sumitomo Electric Industries, Ltd.
3rd Author's Name Motoki Kakui
3rd Author's Affiliation Yokohama Research Labratories, Sumitomo Electric Industries, Ltd.
4th Author's Name Hitoshi Hatayama
4th Author's Affiliation Yokohama Research Labratories, Sumitomo Electric Industries, Ltd.
5th Author's Name Kenji Koyama
5th Author's Affiliation Yokohama Research Labratories, Sumitomo Electric Industries, Ltd.
6th Author's Name Nobuhiro Akasaka
6th Author's Affiliation Yokohama Research Labratories, Sumitomo Electric Industries, Ltd.
7th Author's Name Masayuki Nishimura
7th Author's Affiliation Yokohama Research Labratories, Sumitomo Electric Industries, Ltd.
Date 2000/1/18
Paper # PS99-70, OPE99-118, LQE99-109
Volume (vol) vol.99
Number (no) 545
Page pp.pp.-
#Pages 6
Date of Issue