Presentation 1999/7/9
GaAs-based vertical-cavity surface-emitting laser on Si substrate by MOCVD
F. Kunimasa, T. Fukami, T. Egawa, T. Jimbo, M. Umeno,
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Abstract(in English) We confirmed that thermal cycle annealing (TCA) between 300℃ and 1000℃ contributed to growth of specular surface morphology as well as reduction of threading dislacations in heteroepitazial growth of GaAs on Si. The reflectivity of 23-pair of AlAs/A_10.1Ga_0.9As Distributed Bragg refelector on Si was improved from 97.4% to 99.2% by use of TCA between 300℃and 1000℃. The bandwidth was as wide as 40 nm at the wavelength above 98%. In addition,In_0.02Ga_0.98As 10QWs VCSEL on Si exhibited CW threshold current of 102 mA (6.19 kA / cm^2) at 230 K.
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Keyword(in English) MOCVD / GaAs on Si / Thermal Cycle Annealing / Distributed Bragg Reflector / VCSEL
Paper # LQE99-33
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Committee LQE
Conference Date 1999/7/9(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) GaAs-based vertical-cavity surface-emitting laser on Si substrate by MOCVD
Sub Title (in English)
Keyword(1) MOCVD
Keyword(2) GaAs on Si
Keyword(3) Thermal Cycle Annealing
Keyword(4) Distributed Bragg Reflector
Keyword(5) VCSEL
1st Author's Name F. Kunimasa
1st Author's Affiliation Department of Electrical and Computer Engineerign, Nagoya Institute of Teclmology()
2nd Author's Name T. Fukami
2nd Author's Affiliation Department of Electrical and Computer Engineerign, Nagoya Institute of Teclmology
3rd Author's Name T. Egawa
3rd Author's Affiliation Research Center for Micro-Structure Devices, Nagoya Institute of Teclmology
4th Author's Name T. Jimbo
4th Author's Affiliation Department of Environmental Teclmology and Urban Plarming, Nagoya Institute of Teclmology
5th Author's Name M. Umeno
5th Author's Affiliation Department of Electrical and Computer Engineering, Nagoya Institute of Teclmology : Research Center for Micro-Structure Devices, Nagoya Institute of Teclmology
Date 1999/7/9
Paper # LQE99-33
Volume (vol) vol.99
Number (no) 173
Page pp.pp.-
#Pages 6
Date of Issue