Presentation 1998/7/3
THRESHOLD CURRENT ANALYSIS OF THE GaAs ISLAND LASER ON Si SUBSTRATE.
K.I. ZAMAN, T. EGAWA, T. JIMBO, M. UMENO,
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Abstract(in English) Different characteristics of the self-formed GaAs island laser on Si substrate by metal-organic chemical vapor deposition (MOCVD) using droplet epitaxy were studied. Also the comparison of the results with the conventional quantum well (QW) laser were presented. The studied self-formed GaAs island laser on Si substrate showed the higher gain coefficient, β (1.65cm/A) with lower transparency current density, J_0 (42.4A/cm^2). The characteristic temperature, T_0 of the self-formed GaAs island laser on Si was higher (230 K) than the conventional QW laser on Si. Also, the self-formed GaAs island laser on Si showed the improved reliability than the conventional QW laser on Si.
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Keyword(in English) MOCVD / droplet epitaxy / island laser
Paper # OPE98-40,LQE98-34
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Committee LQE
Conference Date 1998/7/3(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) THRESHOLD CURRENT ANALYSIS OF THE GaAs ISLAND LASER ON Si SUBSTRATE.
Sub Title (in English)
Keyword(1) MOCVD
Keyword(2) droplet epitaxy
Keyword(3) island laser
1st Author's Name K.I. ZAMAN
1st Author's Affiliation Department of Electrical and Computer Engineering, Nagoya Institute of Technology()
2nd Author's Name T. EGAWA
2nd Author's Affiliation Research Center for Micro-Structure Devices, Nagoya Institute of Technology
3rd Author's Name T. JIMBO
3rd Author's Affiliation Department of Environmental Technology and Urban Planning Graduate School of Engineering, Nagoya Institute of Technology
4th Author's Name M. UMENO
4th Author's Affiliation Department of Electrical and Computer Engineering, Nagoya Institute of Technology
Date 1998/7/3
Paper # OPE98-40,LQE98-34
Volume (vol) vol.98
Number (no) 167
Page pp.pp.-
#Pages 6
Date of Issue