Presentation 1998/6/16
Formation of Iron and Iron Disilicide by Laser Ablation
Masayuki OKOSHI, LIU Zhengxin, Mitsugu HANABUSA,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Using pulsed laser deposition(PLD), we deposited iron and iron disilicide thin films on silicon or quartz substrates. Using iron targets of 99.999%, 99.99% and 99.7% purity, the iron films showed no corrosion in 0.001mol/l NaCl aqueous solution. We also found that particles mixed into the films caused corrosion when a cast iron was used as a target. In addition, we formed semiconducting iron desilicide(β-FeSi_2)thin films by depositing a pure iron on silicon substrate heated to 600 to 700℃
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Laser ablation / Fe thin films / Corrosion-resistance / β-FeSi_2 thin films
Paper # LQE98-17
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Conference Information
Committee LQE
Conference Date 1998/6/16(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Formation of Iron and Iron Disilicide by Laser Ablation
Sub Title (in English)
Keyword(1) Laser ablation
Keyword(2) Fe thin films
Keyword(3) Corrosion-resistance
Keyword(4) β-FeSi_2 thin films
1st Author's Name Masayuki OKOSHI
1st Author's Affiliation Department of Electrical and Electronic Engineering, Toyohashi University of Technology()
2nd Author's Name LIU Zhengxin
2nd Author's Affiliation Department of Electrical and Electronic Engineering, Toyohashi University of Technology
3rd Author's Name Mitsugu HANABUSA
3rd Author's Affiliation Department of Electrical and Electronic Engineering, Toyohashi University of Technology
Date 1998/6/16
Paper # LQE98-17
Volume (vol) vol.98
Number (no) 109
Page pp.pp.-
#Pages 6
Date of Issue