Presentation | 1998/6/16 Formation of Iron and Iron Disilicide by Laser Ablation Masayuki OKOSHI, LIU Zhengxin, Mitsugu HANABUSA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Using pulsed laser deposition(PLD), we deposited iron and iron disilicide thin films on silicon or quartz substrates. Using iron targets of 99.999%, 99.99% and 99.7% purity, the iron films showed no corrosion in 0.001mol/l NaCl aqueous solution. We also found that particles mixed into the films caused corrosion when a cast iron was used as a target. In addition, we formed semiconducting iron desilicide(β-FeSi_2)thin films by depositing a pure iron on silicon substrate heated to 600 to 700℃ |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Laser ablation / Fe thin films / Corrosion-resistance / β-FeSi_2 thin films |
Paper # | LQE98-17 |
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Conference Information | |
Committee | LQE |
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Conference Date | 1998/6/16(1days) |
Place (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Lasers and Quantum Electronics (LQE) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Formation of Iron and Iron Disilicide by Laser Ablation |
Sub Title (in English) | |
Keyword(1) | Laser ablation |
Keyword(2) | Fe thin films |
Keyword(3) | Corrosion-resistance |
Keyword(4) | β-FeSi_2 thin films |
1st Author's Name | Masayuki OKOSHI |
1st Author's Affiliation | Department of Electrical and Electronic Engineering, Toyohashi University of Technology() |
2nd Author's Name | LIU Zhengxin |
2nd Author's Affiliation | Department of Electrical and Electronic Engineering, Toyohashi University of Technology |
3rd Author's Name | Mitsugu HANABUSA |
3rd Author's Affiliation | Department of Electrical and Electronic Engineering, Toyohashi University of Technology |
Date | 1998/6/16 |
Paper # | LQE98-17 |
Volume (vol) | vol.98 |
Number (no) | 109 |
Page | pp.pp.- |
#Pages | 6 |
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