Presentation 1995/10/17
A low threshold operation of micro-cavity InGaAs/GaAs vertical-cavity surface-emitting lasers
T. Mukaihara, N. Hatori, N. Ohnoki, A. Matsutani, F. Koyama, K. Iga,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) A low threshold InGaAs/GaAs vertical-cavity surface-emitting laser (VCSEL) array may be one of candidates for future optoelectronics including parallel optical interconnects and optical light communications. In this letter, we have shown some lasing characteristics of VCSELs with mesa-etched structure and oxide confinement structure. We have achieved 0.33 mA threshold in mesa-etched VCSEL and 70 μA in oxide confinement one. To reduce the resistance of p-type GaAs/AlAs distributed Bragg reflectors of VCSELs, we theoretically point out that the heavily doping into the wide band-gap layer is very effective. We have experimentally demonstrated a high Zn doping in AlAs by metal organic chemical vapor deposition. A re-activation of Zn acceptors is realized by N_2 annealing and the maximum hole concentration of 7×10^18cm^<-3> for AlAs is obtained. These low power consumption performances are essential for future 2-D optical systems with density packed VCSELs.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) vertical-cavity surface-emitting laser / low threshold / low power consumption / Native Oxide
Paper # LQE95-85
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Conference Information
Committee LQE
Conference Date 1995/10/17(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) A low threshold operation of micro-cavity InGaAs/GaAs vertical-cavity surface-emitting lasers
Sub Title (in English)
Keyword(1) vertical-cavity surface-emitting laser
Keyword(2) low threshold
Keyword(3) low power consumption
Keyword(4) Native Oxide
1st Author's Name T. Mukaihara
1st Author's Affiliation Tokyo Institute of Technology, Precision & Intelligence Laboratory()
2nd Author's Name N. Hatori
2nd Author's Affiliation Tokyo Institute of Technology, Precision & Intelligence Laboratory
3rd Author's Name N. Ohnoki
3rd Author's Affiliation Tokyo Institute of Technology, Precision & Intelligence Laboratory
4th Author's Name A. Matsutani
4th Author's Affiliation Tokyo Institute of Technology, Precision & Intelligence Laboratory
5th Author's Name F. Koyama
5th Author's Affiliation Tokyo Institute of Technology, Precision & Intelligence Laboratory
6th Author's Name K. Iga
6th Author's Affiliation Tokyo Institute of Technology, Precision & Intelligence Laboratory
Date 1995/10/17
Paper # LQE95-85
Volume (vol) vol.95
Number (no) 294
Page pp.pp.-
#Pages 6
Date of Issue