Presentation 1995/12/8
Surface-Emitting Laser on Si Substrate grown by MOCVD
Naoki NAKANISHI, Yoshihiko MURATA, Hitoshi INABA, Yoshiaki HASEGAWA, Takashi EGAWA, Takashi JIMBO, Masayoshi UMENO,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We have fabricated an AlGaAs/GaAs surface-emitting laser on Si substrate grown by MOCVD. We have also confirmed that this laser was successfully operated under cw condition up to 150K. In this study we report the lifetime of the under pulsed operation at room-temperature and continuous wave (cw) operation at 100K. Usually the GaAs-based lasers on Si substrates suffer from rapid degradation due to dislocation density and high residual stress. Using cathodeluminescence measurement, we confirmed the reduction of dislocation density and residual stress by use of post-growth patterning and annealing (at 850℃ for 1 hour under AsH3) This technique is very promising for the realization of room-temperature cw operation of surface-emitting laser on Si.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) MOCVD / GaAs on Si / surface-emitting laser / multi quantum wells / cw operation
Paper # LQE95-112
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Conference Information
Committee LQE
Conference Date 1995/12/8(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Surface-Emitting Laser on Si Substrate grown by MOCVD
Sub Title (in English)
Keyword(1) MOCVD
Keyword(2) GaAs on Si
Keyword(3) surface-emitting laser
Keyword(4) multi quantum wells
Keyword(5) cw operation
1st Author's Name Naoki NAKANISHI
1st Author's Affiliation Department of Electrical and Computer Engineering, Nagoya Institute of Technology()
2nd Author's Name Yoshihiko MURATA
2nd Author's Affiliation Department of Electrical and Computer Engineering, Nagoya Institute of Technology
3rd Author's Name Hitoshi INABA
3rd Author's Affiliation Department of Electrical and Computer Engineering, Nagoya Institute of Technology
4th Author's Name Yoshiaki HASEGAWA
4th Author's Affiliation Department of Electrical and Computer Engineering, Nagoya Institute of Technology
5th Author's Name Takashi EGAWA
5th Author's Affiliation Research Center for Micro-Structure Devices, Nagoya Institute of Technology
6th Author's Name Takashi JIMBO
6th Author's Affiliation Research Center for Micro-Structure Devices, Nagoya Institute of Technology
7th Author's Name Masayoshi UMENO
7th Author's Affiliation Research Center for Micro-Structure Devices, Nagoya Institute of Technology
Date 1995/12/8
Paper # LQE95-112
Volume (vol) vol.95
Number (no) 403
Page pp.pp.-
#Pages 6
Date of Issue