Presentation | 1997/8/21 Fabrication of slant Si films and application to a walk-off polarizer with wide apertures Tomoyuki Aoyagi, Isamu Ito, Kazuo Shiraishi, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We fabricated Si films composed of slant microcolumns, and have obtained much larger beam-splitting angles. Previously, we fabricated Ta_2O_5 films with wide apertures and confirmed the principal operation as a walk-off polarizer, but the polarization-splitting angle was small. To attain the large polarization-splitting angle, we chose Si as the material of films. Films that have a microcolumnar orientation angle as large as 58° is obtained by evaporating Si at a large angle of vapor-beam incidence. The measured polarization-splitting angle of the sample is 20° at the wavelength 1.55μm, which is 3.5 times larger than that of rutile or calcite. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | walk-off polarizer / columnar structure / silicon / oblique deposition |
Paper # | LQE97-46 |
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Conference Information | |
Committee | LQE |
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Conference Date | 1997/8/21(1days) |
Place (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Lasers and Quantum Electronics (LQE) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Fabrication of slant Si films and application to a walk-off polarizer with wide apertures |
Sub Title (in English) | |
Keyword(1) | walk-off polarizer |
Keyword(2) | columnar structure |
Keyword(3) | silicon |
Keyword(4) | oblique deposition |
1st Author's Name | Tomoyuki Aoyagi |
1st Author's Affiliation | Faculty of Engineering Utsunomiya University() |
2nd Author's Name | Isamu Ito |
2nd Author's Affiliation | SHINCRON Co., Ltd. |
3rd Author's Name | Kazuo Shiraishi |
3rd Author's Affiliation | Faculty of Engineering Utsunomiya University |
Date | 1997/8/21 |
Paper # | LQE97-46 |
Volume (vol) | vol.97 |
Number (no) | 237 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |