Presentation 2002/5/10
Molecularbeam Epitaxy of High Quality Nitride Semiconductors and Fabrication of Resonant Tunneling Diodes
Akihiko KIKUCHI, Tetsuo TACHIBANA, Katsumi KISHINO,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) The polarity control technology for Ga-polar GaN with molecular beam epitaxy using rf-plasma nitrogen source (RF-MBE) was established. Inserting high-temperature grown AlN multiple interlayers (HT-AlN-MIL) into MBE-grown GaN at 750℃ suppressed the propagation of dislocations into upper GaN, and the electrical and optical properties were improved. The HT-AlN-MIL was deposited on GaN templates grown by metal organic chemical vapor deposition (MOCVD), followed by GaN grown by MBE. The dislocations with screw character in MBE-grown GaN were reduced by about two orders of magnitude compared to those of the bottom GaN template, which produced the step-like surface morphology for MBE-GaN. AlN/GaN double barrier resonant tunneling diodes (RTD) were fabricated by RF-MBE on MOCVD-GaN templates, using this dislocation reduction technique. Clear negative differential resistance with a peak-to-valley ratio over 30 has been obtained.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Nitride Semiconductor / Molecular Beam Epitaxy / Gallium Nitride / Aluminum Nitride / Multiple Interlayer / Resonant Tunneling Diode
Paper # LQE2002-18
Date of Issue

Conference Information
Committee LQE
Conference Date 2002/5/10(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Molecularbeam Epitaxy of High Quality Nitride Semiconductors and Fabrication of Resonant Tunneling Diodes
Sub Title (in English)
Keyword(1) Nitride Semiconductor
Keyword(2) Molecular Beam Epitaxy
Keyword(3) Gallium Nitride
Keyword(4) Aluminum Nitride
Keyword(5) Multiple Interlayer
Keyword(6) Resonant Tunneling Diode
1st Author's Name Akihiko KIKUCHI
1st Author's Affiliation Department of Electrical & Electronics Engineering, Sophia University()
2nd Author's Name Tetsuo TACHIBANA
2nd Author's Affiliation Department of Electrical & Electronics Engineering, Sophia University
3rd Author's Name Katsumi KISHINO
3rd Author's Affiliation Department of Electrical & Electronics Engineering, Sophia University
Date 2002/5/10
Paper # LQE2002-18
Volume (vol) vol.102
Number (no) 62
Page pp.pp.-
#Pages 4
Date of Issue