Presentation 2002/6/8
Growth of GaN/AlN Quantum Wells and Characteristics of Intersubband Transition
Norio IIZUKA, Kei KANEKO, Nobuo SUZUKI,
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Abstract(in English) GaN/AlN quantum well structures were grown by MBE and the crystalline quality and the characteristics of intersubband transition in near infrared region were investigated. Although the layer consisted of as many as 200 wells, good periodicity was confirmed by cross-sectional TEM images and X-ray diffraction. Analysis of the absorption spectra indicated that the wells fluctuated in thickness by 2 monolayers (MLs) and the interfaces gradated by 2-3 MLs. Absorptions were sufficiently large for realizing devices. The saturation intensity was as small as 0.5 pJ/μm^2 this indicated that the devices would be available for practical use. More over, waveguide structures were fabricated and the intersubband absorptions were successfully observed.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / Quantum well / Intersubband transition / MBE
Paper # LQE2002-76
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Committee LQE
Conference Date 2002/6/8(1days)
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Paper Information
Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Growth of GaN/AlN Quantum Wells and Characteristics of Intersubband Transition
Sub Title (in English)
Keyword(1) GaN
Keyword(2) Quantum well
Keyword(3) Intersubband transition
Keyword(4) MBE
1st Author's Name Norio IIZUKA
1st Author's Affiliation Corporate R & D Center, Toshiba Corp.()
2nd Author's Name Kei KANEKO
2nd Author's Affiliation Corporate R & D Center, Toshiba Corp.
3rd Author's Name Nobuo SUZUKI
3rd Author's Affiliation Corporate R & D Center, Toshiba Corp.
Date 2002/6/8
Paper # LQE2002-76
Volume (vol) vol.102
Number (no) 119
Page pp.pp.-
#Pages 4
Date of Issue