Presentation 2002/6/8
Electron emission from polycrystalline GaN on metal substrate
T. Yamanaka, H. Tampo, M. Hashimoto, H. Asahi,
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Abstract(in English) Polycrystalline GaN layers are grown on polycrystalline Mo substrate by ECR-MBE. They have 300-600nm-size grain structures and tip-like structures. GaN/Mo interface shows ohmic I-V characteristics. Field emission (FE) measurement shows a turn-on electric field of as low as 10.6 V/μm at an emission current of 1 nA. We obtained a field emission current density of 260 μA/cm^2 at the electric field of 22 V/μm.
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Keyword(in English) polycrystalline GaN / Mo metal substrate / field emission / molecular beam epitaxy / threshold electric field
Paper # LQE2002-72
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Committee LQE
Conference Date 2002/6/8(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Electron emission from polycrystalline GaN on metal substrate
Sub Title (in English)
Keyword(1) polycrystalline GaN
Keyword(2) Mo metal substrate
Keyword(3) field emission
Keyword(4) molecular beam epitaxy
Keyword(5) threshold electric field
1st Author's Name T. Yamanaka
1st Author's Affiliation The Institute of Scientific and Industrial, Osaka University()
2nd Author's Name H. Tampo
2nd Author's Affiliation The Institute of Scientific and Industrial, Osaka University
3rd Author's Name M. Hashimoto
3rd Author's Affiliation The Institute of Scientific and Industrial, Osaka University
4th Author's Name H. Asahi
4th Author's Affiliation The Institute of Scientific and Industrial, Osaka University
Date 2002/6/8
Paper # LQE2002-72
Volume (vol) vol.102
Number (no) 119
Page pp.pp.-
#Pages 4
Date of Issue