Presentation 2002/6/7
Characterization of GaN and AlGaN Surfaces and Their Insulated Gate Structures
Tamotsu Hashizume, Shinya Ootomo,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) A combination of a wet chemical process in NH_4OH solution and a ECR-N_2 plasma treatment was found to be effective in reducing the surface band bending on GaN surfaces. A nitrogen-vacancy-related surface state was introduced near Ec-0.5 eV on the GaN surfaces exposed to H_2 plasma. A SiN_x/GaN structure prepared by ECR-CVD process showed good interface properties with low interface state densities. An ultrathin (below 4nm) AlO_X layer was successfully fabricated on the AlGaN surface and applied to insulated-gate type GaN/AlGaN heterostructure filed-effect transistors (IG-HEET).
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / AlGaN / surface / interface / insulated gate / HFET
Paper # LQE2002-62
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Conference Information
Committee LQE
Conference Date 2002/6/7(1days)
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Paper Information
Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Characterization of GaN and AlGaN Surfaces and Their Insulated Gate Structures
Sub Title (in English)
Keyword(1) GaN
Keyword(2) AlGaN
Keyword(3) surface
Keyword(4) interface
Keyword(5) insulated gate
Keyword(6) HFET
1st Author's Name Tamotsu Hashizume
1st Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University()
2nd Author's Name Shinya Ootomo
2nd Author's Affiliation School of Electronics and Information Engineering, Hokkaido University
Date 2002/6/7
Paper # LQE2002-62
Volume (vol) vol.102
Number (no) 118
Page pp.pp.-
#Pages 4
Date of Issue