Presentation 2002/6/6
Growth of Hexagonal GaN on Si(111) by Using a porous GaN Interlayer
Bablu K. GHOSH, Toru TANIKAWA, Akihiro HASHIMOTO, Akio YAMAMOTO, Yoshifumi ITO,
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Abstract(in English) In this paper we propose a new interlayer for the GaN epitaxial growth on Si to minimize residual stress in the grown film. High quality GaN epilayer was grown successfully on Si by using porous GaN interlayer converted from GaAs.
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Keyword(in English) GaN / Si(111) / interlayer / GaAs / nitridation / porous GaN / residual stress
Paper # LQE2002-26
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Committee LQE
Conference Date 2002/6/6(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Growth of Hexagonal GaN on Si(111) by Using a porous GaN Interlayer
Sub Title (in English)
Keyword(1) GaN
Keyword(2) Si(111)
Keyword(3) interlayer
Keyword(4) GaAs
Keyword(5) nitridation
Keyword(6) porous GaN
Keyword(7) residual stress
1st Author's Name Bablu K. GHOSH
1st Author's Affiliation Faculty of engineering, Fukui University()
2nd Author's Name Toru TANIKAWA
2nd Author's Affiliation Faculty of engineering, Fukui University
3rd Author's Name Akihiro HASHIMOTO
3rd Author's Affiliation Faculty of engineering, Fukui University
4th Author's Name Akio YAMAMOTO
4th Author's Affiliation Faculty of engineering, Fukui University
5th Author's Name Yoshifumi ITO
5th Author's Affiliation Wakasa-wan Energy Research Center
Date 2002/6/6
Paper # LQE2002-26
Volume (vol) vol.102
Number (no) 117
Page pp.pp.-
#Pages 4
Date of Issue