Presentation 2003/6/27
RT-CW Operation of GaInAsP/InP Strain-Compensated Multiple Quantum-Wire Lasers Fabricated by Dry-Etching and Regrowth
Hideki YAGI, Takuya SANO, Kazuya OHIRA, Takeo MARUYAMA, Anisul HAQUE, Shigehisa ARAI,
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Abstract(in English) RT-CW operation of GaInAsP/InP quantum-wire lasers fabricated by electron beam lithography, CH_4/H_2-reactive ion etching and organometallic vapor-phase-epitaxial regrowth was realized for the first time. A threshold current density of 802 A/cm^2 and differential quantum efficiency of 36 % were obtained for a device with strain-compensated 5-stacked quantum-wires with the wire width of 23 nm in the period of 80 nm, the stripe width of 15 μm and the cavity length of 1.15 mm. From lifetime measurement under RT-CW condition, no noticeable degradation in light output was observed even after more than 4,300 hours. These results indicate moderate reliability of GaInAsP/InP quantum-wire lasers fabricated by dry etching and regrowth processes.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Quantum-Wire Laser / GaInAsP-InP / Strain-Compensated Quantum-Well / CH_4-H_2-RIE / OMVPE Regrowth
Paper # OPE2003-31,LQE2003-25
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Committee OPE
Conference Date 2003/6/27(1days)
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Registration To Optoelectronics (OPE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) RT-CW Operation of GaInAsP/InP Strain-Compensated Multiple Quantum-Wire Lasers Fabricated by Dry-Etching and Regrowth
Sub Title (in English)
Keyword(1) Quantum-Wire Laser
Keyword(2) GaInAsP-InP
Keyword(3) Strain-Compensated Quantum-Well
Keyword(4) CH_4-H_2-RIE
Keyword(5) OMVPE Regrowth
1st Author's Name Hideki YAGI
1st Author's Affiliation Research Center for Quantum Effect Electronics, Tokyo Institute of Technology()
2nd Author's Name Takuya SANO
2nd Author's Affiliation Research Center for Quantum Effect Electronics, Tokyo Institute of Technology
3rd Author's Name Kazuya OHIRA
3rd Author's Affiliation Research Center for Quantum Effect Electronics, Tokyo Institute of Technology
4th Author's Name Takeo MARUYAMA
4th Author's Affiliation Research Center for Quantum Effect Electronics, Tokyo Institute of Technology:JST-CREST
5th Author's Name Anisul HAQUE
5th Author's Affiliation Research Center for Quantum Effect Electronics, Tokyo Institute of Technology:JST-CREST
6th Author's Name Shigehisa ARAI
6th Author's Affiliation Research Center for Quantum Effect Electronics, Tokyo Institute of Technology:JST-CREST
Date 2003/6/27
Paper # OPE2003-31,LQE2003-25
Volume (vol) vol.103
Number (no) 171
Page pp.pp.-
#Pages 4
Date of Issue